Photonic Structures from Self Assembly of Brush Block Copolymers and Polymer Blends

ABSTRACT

The invention provides a class of block copolymers having a plurality of chemically different blocks, at least a portion of which incorporating polymer side chain groups having a helical secondary structure. The invention also provides structures generated by self-assembly of polymer blends including at least one block copolymer component, such as a brush block polymer or wedge-type block polymer. The invention provides, for example, periodic nanostructures and microstructures generated by self-assembly of block copolymers and polymer blends comprising a mixture of at least one block copolymer component, such as a brush block copolymer, and at least a second component.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application claims the benefit of priority of U.S. ProvisionalPatent Application No. 61/665,696, filed Jun. 28, 2012, which is herebyincorporated by reference in its entirety to the extent not inconsistentwith the disclosure herein.

STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT

This invention was made with government support under CHE0809418 awardedby National Science Foundation. The government has certain rights in theinvention.

BACKGROUND OF INVENTION

Well-defined, periodic nanostructures have received considerableattention since they can serve as useful templates and scaffolds fornanodots, nanowires, magnetic storage media, semiconductors, opticaldevices, polarizers, and photonic materials. For this purpose, bottom-upapproaches have extensively been studied because they can offer anefficient, cost-effective strategy to overcome the technological andeconomic limits associated with large-scale top-down approaches. Theself-assembly of block copolymers (BCPs), one of the most promisingcandidates for this purpose, have been studied as the sizes, spacings,and morphologies of the nanostructures from the self-assembled BCPs canbe simply tuned by varying molecular weight and composition ratio ofBCPs and, more importantly, the versatilities in the properties of theblocks can be easily introduced by many well-known chemical techniques.

For some practical applications like polarizers and photonic band gapmaterials for visible wavelengths, the alternating domain spacing of theself-assembled BCPs usually has to be up to a few hundred nanometers.Thomas and coworkers utilized the partially cross-linked, conventionalBCPs to prepare the photonic band gap materials for visible wavelengths,but this normally requires the molecular weight (MW) of BCPs to beextremely large for the applications mentioned above [Y. Kang, J. J.Walish, T. Gorishnyy, E. L. Thomas, Nat. Mater. 2007, 6, 957]. It isnoted that, according to the model system for polymers with the MW overthe critical entanglement MW, the viscosity of polymers gets higherabruptly as the MW gets larger due to polymer chain-entanglement, whichyields a significant kinetic barrier for the effective self-assembly ofconventional BCPs with high MW. For this reason, the defects might notbe able to be effectively annihilated even upon longer annealing timedue to the entanglement, and there could be degradation of polymerchains upon thermal treatment due to significantly increased annealingtemperature and time to overcome the kinetic barrier.

Brush polymers (also called comb or graft polymers) are grafted polymerswith both relatively high MW and significantly dense and regularlyspaced side brush chains attached to the backbone. Due to thesignificant steric hindrance between densely grafted side brush chains,brush polymers have a highly extended backbone and exhibit a reduceddegree of chain-entanglement compared to conventional polymers.Therefore, it is often favorable for brush polymers to self-assembleinto well aligned and ordered nanostructures even though the MW of brushpolymers is relatively high. There are three general methods to makebrush polymers. In the “grafting from” approach, a macro-initiatorbackbone is first synthesized but there are limitations in theefficiency of its initiation and conversion of monomers. The “graftingonto” method, where the side chains and the backbone are separatelysynthesized and then coupled together, have difficulties in obtainingcomplete grafting due to increasing steric hindrance and the subsequentpurification of unreacted brush side chains can be problematic. In the“grafting through” method, which is also called the “Macromonomer (MM)approach” the side chains are synthesized with a polymerizable end groupwhich is subsequently polymerized. This approach has many advantagesover those ‘graft from’ or ‘graft onto’ approaches, but still containsdrawbacks like not being able to obtain high MW and/or narrowpolydispersity index (PDI). Recently, Grubbs and coworkers successfullyreported a novel ring-opening metathesis polymerization (ROMP)exploiting the high ring strain of norbornene monomer and the highactivity of Ru-based olefin metathesis catalyst to synthesize brushpolymers with ultra-high MW, narrow PDI, and well-defined, structuralarchitectures [see, Y. Xia, B. D. Olsen, J. A. Kornfield, R. H. Grubbs,J. Am. Chem. Soc. 2009, 131, 18525]. It is noted that, when twodifferent brush side chains, where the difference in polymer interactionparameters is large enough to induce microphase segregation, are used toprepare blocky or random type of brush polymers with ultra-high MW, one,two, or three dimensionally periodic nanostructures with extremely largefeature sizes can be achieved, due to the significantly reduced degreeof entanglements.

While BCPs have been previously used to make periodic dielectric media,the use of brush copolymers has not been extensively studied before now.There have been a couple of observations made in past publications.Bowden et al. reported in 2007 that they observed one of their blockcopolymers, that was combined of one grafted block and one linear block,reflecting blue light (and transmitting yellow light) and upon swellingwith solvent, as is common with linear polymers, they were able toobserve a red color. That system was still limited by the high degree ofpolymerization (≈450:2000) of the graft:linear block required to observethis optical property [see, M. B. Runge, N. B. Bowden, J. Am. Chem. Soc.2007, 129, 10551]. Rzayev reported in 2009 that one of his brush blockcopolymers appeared to reflect blue light indicating interaction withvisible light [see, J. Rzayev, Macromolecules 2009, 42, 2135]. In 2009we noted that we saw one of our brush block copolymers reflect greenlight but no further analysis or discussion was made apart from thatsimple observation [see, Y. Xia, B. D. Olsen, J. A. Kornfield, R. H.Grubbs, J. Am. Chem. Soc. 2009, 131, 18525].

It will be apparent from the foregoing description that block copolymermaterials exhibiting useful physical, chemical and optical propertiesare useful for a range of applications including photonics,optoelectronics, and molecular templates and scaffolding. Specificallyblock copolymer materials are needed that are capable of efficientself-assembly to generate useful periodic structures with domain lengthsin the nanometer range and exhibiting optical functionality in thevisible and NIR regions of the electromagnetic spectrum.

SUMMARY OF THE INVENTION

The invention provides a class of block copolymers having a plurality ofchemically different blocks, at least a portion of which incorporatingpolymer side chain groups having a helical secondary structure.Incorporation of polymer chain chains having helical secondary structurein polymer blocks of some brush block copolymers of the inventionsignificantly inhibits chain entanglement and, thus, the present blockcopolymers provide a class of polymers capable of efficient molecularself-assembly to supramolecular structures under non-stringentconditions, for example, via solvent evaporation or the application ofan external pressure under ambient conditions. Incorporation of apolymer block comprising polymer side chain groups having helicalsecondary structure in some of the block copolymers the inventionprovides a means of imparting steric properties resulting in an extendedor elongated polymer backbone configuration allowing for rapidself-assembly to stacked lamellae of alternating layers ofblock-copolymer components. Brush block copolymers of some embodimentsare characterized by high molecular weights (e.g., >1000 kDa) and apolydispersity index less than or equal to 3.

Brush block copolymers incorporating a block comprising polyisocyanatepolymer side chains, for example, are capable of generating a range ofstructures via self-assembly, such as periodic nanostructures andmicrostructures providing photonic band gap materials exhibiting usefuloptical properties in the ultra-violet, visible, and infrared regions ofthe electromagnetic spectrum. The invention also provides structuresgenerated by self-assembly of polymer blends including at least oneblock copolymer component, such as a brush block polymer or wedge-typeblock polymer. Blending can be used to modify the domain size ormorphology of the nanostructured material. The invention provides, forexample, periodic nanostructures and microstructures generated byself-assembly of polymer blends comprising a mixture of at least twodifferent polymers including a block copolymer component, such as abrush block copolymer. Structures of certain embodiments, for example,exhibit optical properties, such as reflectance and transmission, whichare selectively tunable from the ultra-violet, through visible, and intothe IR regions of the electromagnetic spectrum by varying the relativeamounts and/or compositions of polymer components of a polymer blend.

The present invention also provides methods of making and using blockcopolymers and methods of making and using self-assembled structurescomprising block copolymers. Compositions and materials of the inventionexhibit properties supporting a range of applications includingIR-reflecting paints, UV-protective coatings, molecular templates,catalysis support, optical coating, drug delivery among others. Methodsof the invention including methods of making and using photonic bandgaps materials.

In an aspect, the invention provides a block copolymer comprising: (i) afirst polymer block comprising at least 10 first repeating units;wherein each of the first repeating units of the first polymer blockcomprises a first polymer backbone group directly or indirectlycovalently linked to a first polymer side chain group having a helicalsecondary structure, wherein each of the first polymer side chain groupsof the first polymer block independently comprises a number of repeatingunits greater than or equal to 10; and (ii) a second polymer blockcomprising at least 10 second repeating units; wherein each of thesecond repeating units of the second polymer block comprises a secondpolymer backbone group directly or indirectly covalently linked to asecond polymer side chain group that is different than the first polymerside chain group or a first wedge group; wherein the first and secondrepeating units are directly or indirectly covalently linked along abackbone of the block copolymer. In an embodiment, the first polymerblock comprises a plurality of first polymer side chain groups and thesecond polymer block comprise a plurality of second polymer side chaingroups having a composition different than the first polymer side chaingroups. In an embodiment, the first polymer block comprises a pluralityof first polymer side chain groups and the second polymer block comprisea plurality of wedge groups having a composition different than thefirst polymer side chain groups. In an embodiment, the first polymerside chain groups of the first polymer block independently comprises anumber of repeating units greater than or equal to 30; and optionallyfor some applications greater than or equal to 50; and optionally forsome applications greater than or equal to 100.

In an embodiment, the polymer side chain groups of the first polymerblock have the same chemical composition, number of repeating unitsand/or molecular weight. In an embodiment, the polymer side chain groupsof the second polymer block have the same chemical composition, numberof repeating units and/or molecular weight. In an embodiment, the wedgegroups of the second polymer block have the same chemical compositionand/or molecular weight.

Block copolymers of this aspect may comprise brush block copolymersincluding wedge block containing brush block copolymers. In anembodiment, for example, the block copolymer of this aspect comprises abrush block copolymer, for example, having at least two chemicallydifferent polymer blocks, such as at least two polymer blocks comprisingpolymer side chain groups having different chemical compositions or acombination of polymer side chain-containing polymer block(s) andwedge-containing polymer block. In an embodiment, for example, a blockcopolymer of the invention comprises 10 to 2000 of the first repeatingunits and 10 to 2000 of the second repeating units, optionally for someembodiments 100 to 2000 of the first repeating units and 100 to 2000 ofthe second repeating units and optionally for some embodiments 500 to2000 of the first repeating units and 500 to 2000 of the secondrepeating units. In an embodiment, for example, a block copolymer ofthis aspect comprises 50 to 5000 repeating units, optionally for someapplications 200 to 2000 repeating units. In an embodiment, the ratio ofthe number of first repeating units of the first polymer block to thesecond repeating units of the second polymer block is selected over therange of 0.005 to 200, and optionally for some application selected overthe range of 0.1 to 10. In an embodiment, for example, a block copolymerof the invention has a molecular weight selected from the range of100,000 Da up to 30,000,000 Da, optionally for some embodiments 500,000Da up to 30,000,000 Da; and optionally for some embodiments 1,000,000 Daup to 20,000,000 Da.

The invention includes block copolymers comprising blocks having thesame or different sizes, for example, block copolymers wherein first andsecond polymer blocks are the same length, or alternatively wherein thefirst polymer block is larger than the second polymer block, oralternatively wherein the second polymer block is larger than the firstpolymer block. In an embodiment, the first polymer block and/or thesecond polymer block of the block copolymers provide steric interactionsand/or bulk that enforces the rigidity of the backbone, for example,resulting in an extended polymer backbone configuration. Blockcopolymers of the invention may further comprises additional blocksdirectly or indirectly linked to the first polymer block and/or thesecond polymer block, such as one or more additional wedge-groupcontaining blocks, one or more additional polymer side chain-containingblocks and/or one or more additional wedge-group containing blocks andone or more additional polymer side chain-containing blocks. In anembodiment, for example, a block copolymer of the invention comprisesone, two or three additional polymer blocks directly or indirectlycovalently linked along the backbone of the block copolymer. Theinvention provides diblock copolymers, triblock copolymers, tetra blockcopolymers and higher block copolymers.

In an embodiment, for example, a block copolymer of the invention isfurther characterized by a size scale, such as a length scale. In anembodiment, for example, a size (R) of the copolymer increasessubstantially linearly with molecular weight (MW) of the block copolymerpursuant to the expression (E1) wherein 0.85<x<1:

R∝MW^(x)  (E1).

In an embodiment, for example, a block copolymer of the invention ischaracterized by expression (E1) wherein x is greater than or equal to0.90. In an embodiment, for example, the size (R) of the block copolymercorresponds to a length of the block copolymer. In an embodiment, forexample, the size (R) of the block copolymer corresponds to a domainlength or route mean square radius (RMSR) of a supramolecular assemblyof a plurality of the block copolymers.

In an embodiment, for example, a block copolymer of the invention hasthe formula (FX1a), (FX1b), (FX1c) or (FX1d):

wherein: Z¹ is the first polymer backbone group and Z² is the secondpolymer backbone group; Q¹ is a first backbone terminating group and Q²is a second backbone terminating group; L¹ is a first linking group, L²is a second linking group, L³ is a third linking group and L⁴ is afourth linking group; A is the first polymer side chain group having thehelical secondary structure; B is the second polymer side chain group orthe first wedge group; each of E and D is independently a polymer sidechain group or a wedge group; and each of n and m is independently aninteger selected from the range of 20 to 2000. In an embodiment, forexample, the invention provides a block copolymer having formula(FX1a-FX1d) wherein the ratio of m to n is selected from the range of0.1 to 10, and optionally for some embodiments 0.5 to 2. In anembodiment, for example, the invention provides a block copolymer havingformula (FX1a-FX1d) m is greater than or equal to 100 and wherein n isgreater than or equal to 100. In an embodiment, for example, theinvention provides a block copolymer having formula (FX1a-FX1d) whereinm is an integer selected from the range of 20 to 2000 and n is aninteger selected from the range of 20 to 2000, and optionally for someembodiments wherein m is an integer selected from the range of 100 to2000, optionally 500 to 2000, and n is an integer selected from therange of 100 to 2000, optionally 500 to 2000. In an embodiment, forexample, the invention provides a block copolymer having formula(FX1a-FX1d), wherein m is greater than or equal to 100 and wherein n isgreater than or equal to 100. In an embodiment, for example, theinvention provides a block copolymer having formula (FX1a-FX1d), whereinthe ratio of m to n is selected from the range of 0.1 to 10.

Block copolymers of the invention, such as brush block copolymers, mayincorporate a broad range of polymer backbone groups, including polymerbackbone groups capable of assuming an extended or elongated backboneconfiguration. In an embodiment, for example, the first polymer sidechain group having the helical secondary structure, the second polymerside chain group, the first wedge group or any combination of theseprovides steric interactions within the block copolymer resulting in thebackbone of the block copolymer being an extended backbone. In anembodiment, the invention provides a block copolymer having formula(FX1a-FX1d), wherein Z¹ and Z² are same polymer backbone group, forexample, providing blocks that differ via the composition of the polymerside chain groups and/or wedge groups linked to the polymer backbonegroup. In an embodiment, the invention provides a block copolymer havingformula (FX1a-FX1d), wherein Z¹ and Z² are not the same polymer backbonegroup, for example, providing first and second polymer blocks thatdiffer via the composition of the polymer side chain groups and/or wedgegroups in addition to the first and second polymer blocks havingdifferent polymer backbone groups.

In an embodiment, the invention provides a block copolymer wherein thefirst polymer backbone groups and/or second polymer backbone groups areobtained from a ring opening metathesis polymerization (ROMP) reaction.In an embodiment, the invention provides a block copolymer wherein thefirst polymer block and the second polymer block are directly covalentlylinked along the backbone. In an embodiment, the invention provides ablock copolymer wherein the first polymer block and the second polymerblock are indirectly covalently linked along the backbone. In anembodiment, the invention provides a block copolymer having formula(FX1a-FX1d), wherein Z¹ and Z² are derived from polymerization of amonomer selected from the group consisting of a substituted orunsubstituted norbornene, olefin or cyclic olefin, such as norbornene,norbornene anhydride, cyclooctene, cyclopentadiene, styrene, ester,ether, thioether, amine, imide, halocarbon chain (perfluoro, etc.) andacrylate

In an embodiment, the invention provides a block copolymer having theformula (FX2a), (FX2b), (FX2c), (FX2d), (FX2e), (FX2f) or (FX2g),

wherein each of U¹ and U² is independently —O— or —CH₂—; wherein Q¹, Q²,m, n, L¹, L², L³, L⁴, A, B, E and D are as defined in connection withformulas (FX1a-FX1d). In an embodiment, the invention provides a blockcopolymer has the formula (FX3a), (FX3b), (FX3c), (FX3d), (FX3e),(FX3f), (FX3g), (FX3h), (FX3i), (FX3j) or (FX3k):

wherein Q¹, Q², m, n, L¹, L², L³, L⁴, A, B, E and D are as defined inconnection with formulas (FX1a-FX1d). In an embodiment, for example, theinvention provides a block copolymer having any of formula (FX2a-FX3k)wherein the ratio of m to n is selected from the range of 0.1 to 10. Inan embodiment, for example, the invention provides a block copolymerhaving any of formula (FX2a-FX3k) wherein m is an integer selected fromthe range of 20 to 2000 and n is an integer selected from the range of20 to 2000.

The composition and physical properties of the first polymer block andsecond polymer blocks of block copolymers are important for providingmaterials exhibiting beneficial chemical, physical and opticalproperties. Use of a first polymer block and a second polymer blockhaving complementary compositions and properties is beneficial.Particularly useful for some application are use of a first polymerblock and a second polymer block that are sufficiently chemicallydissimilar and also capable of imparting steric properties to enforcethe polymer backbone to provide for efficient self-assembly to formuseful supramolecular structures, including lamellar structures.

The invention includes polymer materials comprising a range of polymerside chain groups having a helical secondary structure. In anembodiment, for example, each of the first polymer side chain groups ofthe first polymer block has a rigid-rod helical secondary structureand/or are large enough to result in the backbone of the block copolymerbeing an extended backbone. In an embodiment, for example, each of thefirst polymer side chain groups of the first polymer block has amolecular weight greater than or equal to 500 Da, optionally for someembodiments greater than or equal to 1000 Da and optionally for someembodiments greater than or equal to 2000 Da. In an embodiment, forexample, each of the first polymer side chain groups of the firstpolymer block has a molecular weight selected from the range of 500 Dato 10,000 Da, and optionally for some embodiments selected from therange of 1000 Da to 10,000 Da, and optionally for some embodimentsselected from the range of 2000 Da to 10,000 Da. In an embodiment, forexample, each of the first polymer side chain groups of the firstpolymer block is characterized by a number of repeating units selectedfrom the range of 30 to 2000. In an embodiment, for example, the firstpolymer side chain groups of the first polymer block are characterizedby polydispersity index less than or equal to 3. In an embodiment, forexample, the first polymer side chain groups of the first polymer blockcomprise repeating units obtained via anionic polymerization, cationicpolymerization, free radical polymerization, group transferpolymerization, or ring-opening polymerization. In an embodiment, forexample, the first polymer side chain groups of the first polymer blockare selected from the group consisting of an unsubstituted orsubstituted polyisocyanate group, polymethacrylate group, polyacrylategroup, polymethacrylamide group, polyacrylamide group, polyquinoxalinegroup, polyguanidine group, polysilane group, polyacetylene group,polyamino acid group, polypeptide group, and polychloral group.

In an embodiment, each of the first polymer side chain groups of thefirst polymer block has any of the formula (FX4a), (FX4b), (FX4c),(FX4d), (FX4e), (FX4f) or (FX4g):

wherein each of R¹-R⁷ is independently a hydrogen, C₁-C₃₀ alkyl, C₃-C₃₀cycloalkyl, C₅-C₃₀ aryl, C₅-C₃₀ heteroaryl, C₁-C₃₀ acyl, C₁-C₃₀hydroxyl, C₁-C₃₀ alkoxy, C₂-C₃₀ alkenyl, C₂-C₃₀ alkynyl, C₅-C₃₀alkylaryl, —CO₂R³⁰, —CONR³¹R³², —COR³³, —SOR³⁴, —OSR³⁵, —SO₂R³⁶, —OR³⁷,—SR³⁸, —NR³⁹R⁴⁰, —NR⁴¹COR⁴², C₁-C₃₀ alkyl halide, phosphonate,phosphonic acid, silane, siloxane, silsesquioxane, C₂-C₃₀ halocarbonchain, C₂-C₃₀ perfluorocarbon, C₂-C₃₀ polyethylene glycol, a metal, or ametal complex, wherein each of R³⁰-R⁴² is independently H, C₅-C₁₀ arylor C₁-C₁₀ alkyl; and each of R¹⁰ and R¹¹ is independently a polymer sidechain terminating group and wherein p is an integer selected from therange of 30 to 2000. In an embodiment, for example, the first polymerside chain groups of the polymer block have any one of formula(FX4a-FX4g) wherein each R¹⁰ is independently hydrogen, C₁-C₆ alkyl,C₃-C₆ cycloalkyl, or C₅-C₆ aryl; and optional wherein each R¹⁰ isindependently hydrogen or C₁-C₃ alkyl. In an embodiment, for example,the first polymer side chain groups of the polymer block have any one offormula (FX4a-FX4g) wherein each of R¹-R⁷ is independently a hydrogen,C₁-C₃₀ alkyl, C₃-C₃₀ cycloalkyl, C₅-C₃₀ aryl, C₅-C₃₀ heteroaryl, C₁-C₃₀acyl; and optional wherein each of R¹-R⁷ is independently a hydrogen,C₁-C₁₀ alkyl, C₃-C₁₀ cycloalkyl, C₅-C₁₀ aryl, C₅-C₁₀ heteroaryl, orC₁-C₁₀ acyl.

In an embodiment, the invention provides a block copolymer having theformula (FX5a) or (FX5b);

wherein J is a repeating group of the first polymer side chain group, Kis a repeating group of the second polymer side chain group, G¹ is thefirst wedge group; each of R¹⁰ and R¹¹ is independently a polymer sidechain terminating group; and each of p and q is independently an integerselected from the range of 30 to 2000; and wherein Q¹, Q², m, and n areas defined in connection with formula (FX1a-FX1d). In an embodiment, forexample, the invention provides a block copolymer having the formula(FX9a) or (FX9b):

wherein each of t and v are independently an integer selected from therange of 1 to 10, and optionally 1 to 5 for some embodiments; andwherein and wherein J, K, p, q, R¹¹, R¹⁰, G¹, Q¹, Q², m, and n are asdefined in connection with formula (FX1a-FX5b).

In an embodiment, for example, the invention provides a block copolymerhaving any of formulas (FX5a), (FX5b), (FX9a) and (FX9b), wherein J is agroup corresponding to an unsubstituted or substituted ioscyanate group,methacrylate group, acrylate group, acrylamide group, methacrylamidegroup, quinoxaline group, guanidine group, silane group, acetylenegroup, amino acid group, or chloral group. In an embodiment, forexample, the invention provides a block copolymer having any of formulas(FX5a), (FX5b), (FX9a) and (FX9b), wherein K is a group corresponding toan unsubstituted or substituted isocyanate group, methacrylate group,acrylate group, acrylamide group, methacrylamide group, quinoxalinegroup, guanidine group, silane group, acetylene group, amino acid group,chloral group, lactide group, styrene group, acrylate group, tert-butyl,siloxane group, dimethylsiloxane group, n-butyl acrylate group, ethyleneglycol group, ethylene oxide group, ethylene group, propylene group,tetrafluoroethylene group, or vinyl chloride group. In an embodiment,for example, the invention provides a block copolymer having any offormula formulas ((FX5a), (FX5b), (FX9a) and (FX9b), wherein each R¹⁰and R¹¹ is independently hydrogen, C₁-C₆ alkyl, C₃-C₆ cycloalkyl, orC₅-C₆ aryl; and optional wherein each R¹⁰ is independently hydrogen orC₁-C₃ alkyl.

In an embodiment, the invention provides a block copolymer having theformula (FX6a) or (FX6b);

wherein R¹ is independently a hydrogen, C₁-C₃₀ alkyl, C₃-C₃₀ cycloalkyl,C₅-C₃₀ aryl, C₅-C₃₀ heteroaryl, C₁-C₃₀ acyl, C₁-C₃₀ hydroxyl, C₁-C₃₀alkoxy, C₂-C₃₀ alkenyl, C₂-C₃₀ alkynyl, C₅-C₃₀ alkylaryl, —CO₂R³⁰,—CONR³¹R³², —COR³³, —SOR³⁴, —OSR³⁵, —SO₂R³⁶, —OR³⁷, —SR³⁸, —NR³⁹R⁴⁰,—NR⁴¹COR⁴², C₁-C₃₀ alkyl halide, phosphonate, phosphonic acid, silane,siloxane, silsesquioxane, C₂-C₃₀ halocarbon chain, C₂-C₃₀perfluorocarbon, C₂-C₃₀ polyethylene glycol, a metal, or a metalcomplex, wherein each of R³⁰-R⁴² is independently H, C₅-C₁₀ aryl orC₁-C₁₀ alkyl; and wherein G¹, Q¹, Q², m, n, W¹, R¹⁰, R¹¹, p and q are asdefined in connection with formula (FX1a-FX5b). In an embodiment, forexample, the invention provides a block copolymer having formula (FX6a)or (FX6b), wherein each R¹⁰ and R¹¹ is independently hydrogen, C₁-C₆alkyl, C₃-C₆ cycloalkyl, or C₅-C₆ aryl; and optional wherein each R¹⁰ isindependently hydrogen or C₁-C₃ alkyl. In an embodiment, for example,the first polymer side chain groups of the polymer block have any one offormula (FX6a-FX6b) wherein each of R¹ is independently a hydrogen,C₁-C₃₀ alkyl, C₃-C₃₀ cycloalkyl, C₅-C₃₀ aryl, C₅-C₃₀ heteroaryl, C₁-C₃₀acyl; and optional wherein each of R¹-R⁷ is independently a hydrogen,C₁-C₁₀ alkyl, C₃-C₁₀ cycloalkyl, C₅-C₁₀ aryl, C₅-C₁₀ heteroaryl, orC₁-C₁₀ acyl.

In an embodiment, the invention provides a block copolymer having theformula (FX7):

wherein R¹² is independently a hydrogen, C₁-C₃₀ alkyl, C₃-C₃₀cycloalkyl, C₅-C₃₀ aryl, C₅-C₃₀ heteroaryl, C₁-C₃₀ acyl, C₁-C₃₀hydroxyl, C₁-C₃₀ alkoxy, C₂-C₃₀ alkenyl, C₂-C₃₀ alkynyl, C₅-C₃₀alkylaryl, —CO₂R³⁰, —CONR³¹R³², —COR³³, —SOR³⁴, —OSR³⁵, —SO₂R³⁶, —OR³⁷,—SR³⁸, —NR³⁹R⁴⁰, —NR⁴¹COR⁴², C₁-C₃₀ alkyl halide, phosphonate,phosphonic acid, silane, siloxane, silsesquioxane, C₂-C₃₀ halocarbonchain, C₂-C₃₀ perfluorocarbon, C₂-C₃₀ polyethylene glycol, a metal, or ametal complex, wherein each of R³⁰-R⁴² is independently H, C₅-C₁₀ arylor C₁-C₁₀ alkyl; and wherein R¹ and R¹² are different groups; andwherein Q¹, Q², m, n, R¹⁰, R¹¹, p and q are as defined in connectionwith formula (FX1a-FX6b). In an embodiment, for example, the inventionprovides a block copolymer having formula (FX7), wherein R¹ is a C₁-C₃₀alkyl and R¹² is a C₅-C₃₀ aryl. In an embodiment, for example, theinvention provides a block copolymer having formula (FX7), wherein eachR¹⁰ and R¹¹ is independently hydrogen, C₁-C₆ alkyl, C₃-C₆ cycloalkyl, orC₅-C₆ aryl; and optional wherein each R¹⁰ is independently hydrogen orC₁-C₃ alkyl.

In an embodiment, the invention provides a block copolymer having theformula (FX8a) or (FX8b):

wherein each of r, s, t and v are independently an integer selected fromthe range of 1 to 10; and wherein Q¹, Q², m, n, R¹⁰, R¹¹, p and q are asdefined in connection with formula (FX1-FX7).

In an embodiment, the second polymer block of the block copolymercomprises a second polymer side chain group, optionally having a helicalsecondary structure. In an embodiment, for example, the second polymerside chain groups of the second polymer block are large enough to resultin the backbone of the block copolymer being an extended backbone. In anembodiment, for example, each of the second polymer side chain groups ofthe second polymer block has a rigid-rod helical secondary structure. Inan embodiment, for example, each of the second polymer side chain groupsof the second polymer block has a molecular weight greater than or equalto 500 Da, optionally for some embodiments greater than or equal to 1000Da; and optionally for some embodiments greater than or equal to 2000Da. In an embodiment, for example, each of the second polymer side chaingroups of the second polymer block has a molecular weight selected fromthe range of 500 Da to 10,000 Da, optionally for some embodimentsselected from the range of 1000 Da to 10,000 Da; and optionally for someembodiments selected from the range of 2000 Da to 10,000 Da. In anembodiment, for example, each of the second polymer side chain groups ofthe second polymer block is characterized by a number of repeating unitsselected from the range of 10 to 500, and optionally for someembodiments 20-500; and optionally for some embodiments 100-500. In anembodiment, for example, the second polymer side chain groups of thesecond polymer block are characterized by polydispersity index less thanor equal to 3.

In an embodiment, for example, the second polymer side chain groups ofthe second polymer block comprise repeating units obtained via anionicpolymerization, cationic polymerization, free radical polymerization,group transfer polymerization, or ring-opening polymerization. In anembodiment, for example, the second polymer side chain groups of thesecond polymer block is an unsubstituted or substituted polyisocyanategroup, polymethacrylate group, polyacrylate group, polymethacrylamidegroup, polyacrylamide group, polyquinoxaline group, polyguanidine group,polysilane group, polyacetylene group, polyamino acid group, polypeptidegroup, polychloral group, polylactide group, polystyrene group,polyacrylate group, poly tert-butyl acrylate group, polymethylmethacrylate group, polysiloxane group, polydimethylsiloxane group, polyn-butyl acrylate group, polyethylene glycol group, polyethylene oxidegroup, polyethylene group, polypropylene group, polytetrafluoroethylenegroup, or polyvinyl chloride group.

In an embodiment, the second polymer group comprises wedge groupsindirectly or directly linked to the polymer backbone. In an embodiment,for example, the first wedge group of the second polymer block ischaracterized by at least two branch points each terminating in anindependent terminating branch moiety comprising at least 4 atoms. In anembodiment, for example, first wedge group of the second polymer blockis characterized by at least three branch points each terminating in anindependent terminating branch moiety comprising at least 10 atoms. Inan embodiment, for example, each of the terminating branch moieties ofthe first wedge group independently has a number of atoms selected fromthe range of 10 to 200. In an embodiment, for example, the first wedgegroup of the second polymer block has a molecular weight selected overthe range of 15 Da to 1500 Da, optionally for some applications selectedover the range of 500 Da to 1000 Da. In an embodiment, for example,first wedge group of the second polymer block has a molecular weightgreater than or equal to 50 Da; optionally greater than or equal to 500Da.

In an embodiment, for example, the first wedge group of the secondpolymer block comprises a C₂-C₃₀ alkyl, C₃-C₃₀ cycloalkyl, C₅-C₃₀ aryl,C₅-C₃₀ heteroaryl, C₂-C₃₀ ester, C₂-C₃₀ ether, C₂-C₃₀ thioether, C₂-C₃₀amine, C₂-C₃₀ imide, C₂-C₃₀ halocarbon chain, C₂-C₃₀ perfluorocarbon orC₂-C₃₀ polyethylene glycol. In an embodiment, for example, the firstwedge group of the second polymer block comprises a C₅-C₂₀ alkyl, C₅-C₂₀cycloalkyl, C₅-C₂₀ aryl, C₅-C₂₀ heteroaryl, C₅-C₂₀ ester, C₅-C₂₀ ether,C₅-C₂₀ thioether, C₅-C₂₀ amine, C₅-C₂₀ imide, C₅-C₂₀ halocarbon chain,C₅-C₂₀ perfluorocarbon or C₅-C₂₀ polyethylene glycol. In an embodiment,for example, the first wedge group of the second polymer block comprisesan aromatic or alicyclic ring or fused ring structure. In an embodiment,for example, the first wedge group of the second polymer block comprisesa group derived from a substituted or unsubstituted adamantane,silsesquioxane, norbornane, terpenoid, polyethylene glycol, or borneol.

In an embodiment, for example, the first wedge group of the secondpolymer block has the formula (W1), (W2) or (W3):

wherein each of W¹-W⁵ is independently a linking group; and each ofY¹-Y⁵ is independently a hydrogen, C₁-C₃₀ alkyl, C₃-C₃₀ cycloalkyl,C₅-C₃₀ aryl, C₅-C₃₀ heteroaryl, C₁-C₃₀ acyl, C₁-C₃₀ hydroxyl, C₁-C₃₀alkoxy, C₂-C₃₀ alkenyl, C₂-C₃₀ alkynyl, C₅-C₃₀ alkylaryl, —CO₂R³⁰,—CONR³¹R³², —COR³³, —SOR³⁴, —OSR³⁵, —SO₂R³⁶, —OR³⁷, —SR³⁸, —NR³⁹R⁴⁰,—NR⁴¹COR⁴², C₁-C₃₀ alkyl halide, phosphonate, phosphonic acid, silane,siloxane, silsesquioxane, C₂-C₃₀ halocarbon chain, C₂-C₃₀perfluorocarbon, or C₂-C₃₀ polyethylene glycol; wherein each of R³⁰-R⁴²is independently H, C₅-C₁₀ aryl or C₁-C₁₀ alkyl. In an embodiment, forexample, the first wedge group of the second polymer block has theformula (W1), (W2) or (W3), wherein each of W¹-W⁵ is independently asingle bond, —(CH₂)_(q)—, —(CH₂)_(q)O(CH₂)_(r)—, —(CH₂)_(q)S(CH₂)_(r)—,—(CH₂)_(q)O₂(CH₂)_(r)—, —(CH₂)_(q)SO(CH₂)_(r)—, —(CH₂)_(q)SO₂(CH₂)_(r)—,—(CH₂)_(q)SO₃(CH₂)_(r)—, —(CH₂)_(q)OSO₂(CH₂)_(r)—,—(CH₂)_(q)NR¹⁹(CH₂)_(r)—, —(CH₂)_(q)CO(CH₂)_(r)—,—(CH₂)_(q)COO(CH₂)_(r)—, —(CH₂)_(q)OCO(CH₂)_(r)—,—(CH₂)_(q)OCOO(CH₂)_(r)—, —(CH₂)_(q)CONR²⁰(CH₂)_(r)—,—(CH₂)_(q)NR²¹CO(CH₂)_(r)—, —(CH₂)_(q)OCONR²²(CH₂)_(r)—,—(CH₂)_(q)NR²³COO(CH₂)_(r)—, or —(CH₂)_(q)NR²⁴CONR²⁵(CH₂)_(r)—; whereineach of R¹⁹-R²⁵ is independently hydrogen or C₁-C₅ alkyl; and whereineach of q and r is independently an integer selected from the range of 0to 10. In an embodiment, for example, the first wedge group of thesecond polymer block has the formula (W1), (W2) or (W3), wherein each ofW¹-W⁵ is independently a single bond, —(CH₂)_(q)— or—(CH₂)_(q)O(CH₂)_(r)—. In an embodiment, for example, the first wedgegroup of the second polymer block has the formula (W1), (W2) or (W3),wherein each of Y¹-Y⁵ is independently a hydrogen, C₁-C₃₀ alkyl, C₃-C₃₀cycloalkyl, C₅-C₃₀ aryl, C₅-C₃₀ heteroaryl, or C₁-C₃₀ acyl; and optionalfor some applications a hydrogen, C₁-C₃₀ alkyl, C₃-C₂₀ cycloalkyl,C₅-C₂₀ aryl, or C₅-C₂₀ heteroaryl.

In an embodiment, for example, the first wedge group of the secondpolymer block has the formula (W4), (W5), (W6), (W7), (W8), (W9) or(W10):

-   -   wherein Bn is a benzyl group.

A wide range of linking groups are useful in the block copolymers of theinvention, for example, for linking wedge groups and/or polymer sidechain groups to the polymer backbone groups. In some embodiments, forexample, direct covalent linking is provided by a single bond betweentwo linked groups, such as wedge groups and/or polymer side chain groupsand a polymer backbone groups. In some embodiments, for example,indirect covalent linking is provided by a linking moiety providedbetween two linked groups, such as wedge groups and/or polymer sidechain groups and a polymer backbone groups. In an embodiment, forexample, the invention provides a block copolymer of any of formula(FX1a)-(FX10h), wherein each of L¹, L², L³ and L⁴ is independently asingle bond, —(CH₂)_(q)—, —(CH₂)_(q)O(CH₂)_(r)—, —(CH₂)_(q)S(CH₂)_(r)—,—(CH₂)_(q)O₂(CH₂)_(r)—, —(CH₂)_(q)SO(CH₂)_(r)—, —(CH₂)_(q)SO₂(CH₂)_(r)—,—(CH₂)_(q)SO₃(CH₂)_(r)—, —(CH₂)_(q)OSO₂(CH₂)_(r)—,—(CH₂)_(q)NR¹⁹(CH₂)_(r)—, —(CH₂)_(q)CO(CH₂)_(r)—,—(CH₂)_(q)COO(CH₂)_(r)—, —(CH₂)_(q)OCO(CH₂)_(r)—,—(CH₂)_(q)OCOO(CH₂)_(r)—, —(CH₂)_(q)CONR²⁰(CH₂)_(r)—,—(CH₂)_(q)NR²¹CO(CH₂)_(r)—, —(CH₂)_(q)OCONR²²(CH₂)_(r)—,—(CH₂)_(q)NR²³COO(CH₂)_(r)—, or —(CH₂)_(q)NR²⁴CONR²⁵(CH₂)_(r)—; whereineach of R¹⁹-R²⁵ is independently hydrogen or C₁-C₅ alkyl; and whereineach of q and r is independently an integer selected from the range of 0to 10. In an embodiment, for example, the invention provides a blockcopolymer of any of formula (FX1a)-(FX10h), wherein each of L¹, L², L³and L⁴ is independently C₁-C₁₀ alkylene, C₃-C₁₀ cycloalkylene, C₂-C₁₀alkenylene, C₃-C₁₀ cycloalkenylene, C₂-C₁₀ alkynylene, ethenylene,ethynylene, or phenylene. In an embodiment, for example, the inventionprovides a block copolymer of any of formula (FX1a)-(FX10h), whereineach of L¹, L², L³ and L⁴ is independently C₁-C₅ alkylene. In anembodiment, for example, compositions of the invention comprise one ormore linking groups having the formula:

wherein c is an integer selected from the range of 1 to 10.

A wide range of backbone terminating groups are useful in the blockcopolymers of the invention. In an embodiment, for example, theinvention provides a block copolymer of any of formula (FX1a)-(FX10h),wherein each of Q¹ and Q² is independently hydrogen, C₁-C₁₀ alkyl,C₃-C₁₀ cycloalkyl, C₅-C₁₀ aryl, C₅-C₁₀ heteroaryl, C₁-C₁₀ acyl, C₁-C₁₀hydroxyl, C₁-C₁₀ alkoxy, C₂-C₁₀ alkenyl, C₂-C₁₀ alkynyl, C₅-C₁₀alkylaryl, —CO₂R³⁰, —CONR³¹R³², —COR³³, —SOR³⁴, —OSR³⁵, —SO₂R³⁸, —OR³⁷,—SR³⁸, —NR³⁹R⁴⁰, —NR⁴¹COR⁴², C₁-C₁₀ alkyl halide, phosphonate,phosphonic acid, silane, siloxane, acrylate, or catechol; wherein eachof R³⁰-R⁴² is independently hydrogen, C₁-C₁₀ alkyl or C₅-C₁₀ aryl. In anembodiment, each of R³⁰-R⁴² is independently hydrogen or C₁-C₄ alkyl.

A wide range of polymer side chain terminating groups are useful in theblock copolymers of the invention. In an embodiment, for example, theinvention provides a block copolymer of any of formula (FX1a)-(FX10h),wherein each of R¹⁰ and R¹¹ is independently hydrogen, C₁-C₁₀ alkyl,C₃-C₁₀ cycloalkyl, C₅-C₁₀ aryl, C₅-C₁₀ heteroaryl, C₁-C₁₀ acyl, C₁-C₁₀hydroxyl, C₁-C₁₀ alkoxy, C₂-C₁₀ alkenyl, C₂-C₁₀ alkynyl, C₅-C₁₀alkylaryl, —CO₂R³⁰, —CONR³¹R³², —COR³³, —SOR³⁴, —OSR³⁵, —SO₂R³⁶, —OR³⁷,—SR³⁸, —NR³⁹R⁴⁰, —NR⁴¹COR⁴², C₁-C₁₀ alkyl halide, phosphonate,phosphonic acid, silane, siloxane, acrylate, or catechol; wherein eachof R³⁰-R⁴² is independently hydrogen, C₁-C₁₀ alkyl or C₅-C₁₀ aryl. In anembodiment, each of R³⁰-R⁴² is independently hydrogen or C₁-C₄ alkyl. Inan embodiment, for example, the invention provides a block copolymer ofany of formula (FX1a)-(FX10h), wherein each of R¹⁰ and R¹¹ isindependently hydrogen, C₁-C₆ alkyl, C₃-C₆ cycloalkyl, C₅-C₆ aryl, C₅-C₆heteroaryl, or C₁-C₆ acyl.

The invention includes block copolymers having more than two polymerblocks, such as block copolymers having three polymer blocks, fourpolymer blocks or more than four polymer blocks. In some embodiments,the additional polymer blocks comprise wedge groups and/or polymer sidechain groups directly or indirectly linked to polymer back bone groups.In some embodiments, the additional polymer blocks comprise the samewedge groups and/or polymer side chain groups as the first and secondpolymer blocks. Alternatively, the additional polymer blocks comprisethe different wedge groups and/or polymer side chain groups as the firstand second polymer blocks. Block copolymers having additional polymerblocks are useful for generating a wide range of structures viaself-assembly processes.

In an embodiment, for example, a block copolymer of the inventionfurther comprises a third polymer block comprising at least 10 thirdrepeating units; the third polymer block indirectly or directlycovalently linked to the first polymer block and the second polymerblock along the backbone of the block copolymer; wherein each of therepeating units of the third polymer block comprises a third polymerbackbone group covalently linked to a third polymer side chain group ora second wedge group. In an embodiment, for example, a copolymer of theinvention comprises 20 to 2000 of the third repeating units, optionallyfor some embodiments 100 to 2000 of the third repeating units andoptionally for some embodiments 500 to 2000 of the third repeatingunits. In an embodiment, for example, the third polymer block isprovided between the first polymer block and the second polymer block;or is provided on a side of the first polymer block opposite to thesecond polymer block; or is provided on a side of the second polymerblock opposite to the first polymer block. In an embodiment, forexample, the third polymer backbone group of the third polymer block isthe same as the first polymer backbone group of the first polymer block;or wherein the third polymer backbone group of the third polymer blockis the same as the second polymer backbone group of the second polymerblock, or wherein the third polymer backbone group of the third polymerblock is the same as the first polymer backbone group of the firstpolymer block and the second polymer backbone group of the secondpolymer block. In an embodiment, for example, the second wedge group ofthe third polymer block is different from the first wedge group of thesecond polymer block; or wherein the second wedge group of the thirdpolymer block is different from the first wedge group of the secondpolymer block; or wherein the third polymer side chain group of thethird polymer block is different from the first polymer side chain groupof the first polymer block; or wherein the third polymer side chaingroup of the third polymer block is different from the second polymerside chain group of the second polymer block.

In an embodiment, for example, the invention provides a block copolymerfurther comprises a fourth polymer block comprising at least 10 fourthrepeating units; the fourth polymer block directly or indirectlycovalently linked to the first polymer block, the second polymer blockand the third polymer block along the backbone of the block copolymer;wherein each of the repeating units of the fourth polymer blockcomprises a fourth polymer backbone group covalently linked to a fourthpolymer side chain group or a third wedge group. In an embodiment, forexample, a copolymer of the invention comprises 20 to 2000 of the fourthrepeating units, optionally for some embodiments 100 to 2000 of thefourth repeating units and optionally for some embodiments 500 to 2000of the fourth repeating units. In an embodiment, for example, the fourthpolymer block is provided between the first polymer block and the secondpolymer block; or is provided between the first polymer block and thethird polymer block; or is provided between the second polymer block andthe third polymer block; or is provided on a side of the first polymerblock opposite to the second polymer block; or is provided on a side ofthe first polymer block opposite to the third polymer block; or isprovided on a side of the second polymer block opposite to the firstpolymer block; or is provided on a side of the second polymer blockopposite to the third polymer block. In an embodiment, for example, thefourth polymer backbone group of the fourth polymer block is the same asthe first polymer backbone group of the first polymer block; or whereinthe fourth polymer backbone group of the fourth polymer block is thesame as the second polymer backbone group of the second polymer block;or wherein the fourth polymer backbone group of the fourth polymer blockis the same as the third polymer backbone group of the third polymerblock; or wherein the fourth polymer backbone group of the fourthpolymer block is the same as both the first polymer backbone group ofthe first polymer block and the second polymer backbone group of thesecond polymer block; or wherein the fourth polymer backbone group ofthe fourth polymer block is the same as both the first polymer backbonegroup of the first polymer block and the third polymer backbone group ofthe third polymer block; or wherein the fourth polymer backbone group ofthe fourth polymer block is the same as both the second polymer backbonegroup of the second polymer block and the third polymer backbone groupof the third polymer block; or wherein the fourth polymer backbone groupof the fourth polymer block is the same as the first polymer backbonegroup of the first polymer block, the second polymer backbone group ofthe second polymer block and the third polymer backbone group of thethird polymer block. In an embodiment, for example, the third wedgegroup of the fourth polymer block is different from the first wedgegroup of the second polymer block; or wherein the third wedge group ofthe fourth polymer block is different from the second wedge group of thethird polymer block; or wherein the fourth polymer side chain group ofthe fourth polymer block is different from the first polymer side chaingroup of the first polymer block; or wherein the fourth polymer sidechain group of the fourth polymer block is different from the secondpolymer side chain group of the second polymer block; or wherein thefourth polymer side chain group of the fourth polymer block is differentfrom the third polymer side chain group of the third polymer block.

In another aspect, the invention provides structures generated fromblock copolymers and polymer blends comprising block copolymers, forexample, structures generated from any of the bock copolymercompositions and/or composition classes described herein, including thedisclosed block copolymers and blends thereof. In an embodiment, astructure of the invention is generated via molecular self-assembly, ora similar process, thereby forming a supramolecular assembly comprisinga plurality of copolymers of the invention, such as block copolymers andmixtures of block copolymers, polymers, and/or other components, such asone or more solvents, metals, metal oxides, ceramics, semiconductors,oligomers, small molecules (e.g., molecular weight less than 500 Da,optionally less than 100 Da), microparticles, nanoparticles, etc.Structures of this aspect the present invention include microstructures,nanostructures, periodic structures, lamellar structures, photoniccrystals, thin film structures and photonic band gap materials.

In an embodiment, the invention provides a structure comprising asupramolecular assembly of a plurality of block copolymers; wherein eachof the block copolymers independently comprises: (i) a first polymerblock comprising at least 10 first repeating units; wherein each of thefirst repeating units of the first polymer block comprises a firstpolymer backbone group directly or indirectly covalently linked to afirst polymer side chain group having a helical secondary structure,wherein each of the first polymer side chain groups of the first polymerblock independently comprises a number of repeating units greater thanor equal to 10; and (ii) a second polymer block comprising at least 10second repeating units; wherein each of the second repeating units ofthe second polymer block comprises a second polymer backbone groupdirectly or indirectly covalently linked to a second polymer side chaingroup that is different than the first polymer side chain group or afirst wedge group; wherein the first and second repeating units aredirectly or indirectly covalently linked along a backbone of the blockcopolymer. In an embodiment, for example, the structure comprises aplurality of block copolymers independently having any of the formulas(FX1a)-(FX10h), and optionally one or more additives or othercomponents, such as solvent, solvent, ceramic, metal, metal oxide,liquid, silicon, semiconductor and any mixture or combination of these.

In an embodiment, the invention provides a structure comprising asupramolecular assembly of a polymer blend of at least one blockcopolymer and at least a second component; wherein the polymer blendcomprises: (i) a first block copolymer comprising: a first polymer blockcomprising at least 10 first repeating units; wherein each of the firstrepeating units of the first polymer block comprises a first polymerbackbone group directly or indirectly covalently linked to a firstpolymer side chain group or a first wedge group; and a second polymerblock comprising at least 10 second repeating units; wherein each of thesecond repeating units of the second polymer block comprises a secondpolymer backbone group directly or indirectly covalently linked to asecond polymer side chain group or second wedge group that is differentthan the first polymer side chain group and the first wedge group;wherein the first and second repeating units are directly or indirectlycovalently linked along a backbone of the block copolymer; and (ii) thesecond component having a composition that is different from the firstblock copolymer. As used herein, the expression “having a compositionthat is different from the first block copolymer” refers to a componentthat has a different chemical composition, such as having a differentnumber, type and/or arrangement of atoms, different chemical bonds,different molecular weight or any combination of these. In someembodiments, for example, the second component comprises the samemoieties or similar moieties as the first block copolymer, however, hasa different number of moieties, arrangement of moieties and/or adifferent molecular weight.

In an embodiment, for example, the second component comprises ahomopolymer, a copolymer, an oligomer, a solvent, a metal, a smallmolecule or particle (e.g., microparticle or nanoparticle). In anembodiment, for example, the second component comprises linear copolymeror a random copolymer. In an embodiment, for example, the secondcomponent comprises a second block copolymer, such as a brush blockcopolymer. First and second polymer blocks of said first block copolymermay comprise any of the polymer side chain groups and/or wedge groupdescribed herein. In an embodiment, for example, the second component isa homopolymer, a copolymer, an oligomer, a small molecule, metal orparticle. In an embodiment, for example, the polymer blend comprisesadditional components, such as a third component, fourth component,fifth component or more, which may, or may not, be any combination ofthe above mentioned components.

In an embodiment, for example, the structure of this aspect of theinvention is formed via molecular self-assembly of the block copolymersor a polymer blend to generate the supramolecular assembly. In anembodiment, for example, the structure is formed via thermal annealing,solvent annealing, spin coating, shear alignment, painting, tapecasting, co-extrusion, drop casting, spray coating or by the applicationof an external pressure to block copolymers or a polymer blend of theinvention.

In an embodiment, for example, the structure comprises a periodicstructure. In an embodiment, for example, the structure comprises ananostructure or a microstructure. In an embodiment, for example, thestructure is characterized by at least one domain having a size greaterthan or equal to 80 nm, and optionally for some embodiments at least onedomain having a size greater than 160 nm. In an embodiment, for example,the domain length corresponds to a periodic feature of the structure,optionally having a length greater than or equal to 80 nm, optionallyfor some embodiments greater than or equal to 160 nm. In an embodiment,for example, the structure absorbs, scatters or reflects electromagneticradiation having wavelengths greater than or equal to 400 nm, optionallygreater than or equal to 800 nm, such as visible and/or NIRelectromagnetic radiation. In an embodiment, the structure ischaracterized by an optical thickness greater than or equal to 100 nm,and optionally greater than or equal to 200 nm. As used herein, opticalthickness is equal to the product of the geometric thickness and therefractive index (e.g. optical thickness−(geometricthickness)×(refractive index).

In an embodiment, for example, the structure comprises a onedimensional, two dimensional or three dimensional photonic crystal. Inan embodiment, for example, the structure comprises a photonic band gapmaterial. In an embodiment, for example, the structure comprises a thinfilm structure. In an embodiment, for example, the block copolymers thatmake up the structure are characterized by a polydispersity indexselected over the range of 1 to 3, optionally for some embodimentsselected over the range of 1 to 1.6. In an embodiment, for example, thestructure is a stacked lamellar structure. In an embodiment, forexample, the structure is characterized by a periodically varyingrefractive index. In an embodiment, for example, the structure furthercomprises an additive selected from the group consisting of a ceramic,metal, metal oxide, liquid, silicon, semiconductor and any mixture orcombination of these, for example, wherein the additive is associatedwith only one of the polymer blocks of the block copolymer.

In an embodiment, the structure is characterized by a length scale, forexample, a length scale that scales proportionally with the molecularweight of the block copolymer or polymers of the polymer blend. In anembodiment, for example, the structure is characterized by a size (S)that increases substantially linearly with molecular weight (MW) of thefirst block copolymer pursuant to the expression (E4) wherein 0.85<x<1:

S∝MW^(x)  (E4).

In an embodiment, for example, the structure is characterized by a size(S) characterized by expression E4 wherein x is greater than or equal to0.90. In an embodiment, the size (S) of the structure corresponds to adomain length, for example, domain length is greater than or equal to 80nm. In an embodiment, for example, the domain length corresponds to aperiodic feature of the structure.

A range of polymer blend are useful for making structures of this aspectof the invention. In an embodiment, for example, the weight percent ofthe first block copolymer in the polymer blend is greater than or equalto 1%, optionally for some aspects, greater than 20% and optionally forsome applications greater than 50%. In an embodiment, for example, theweight percent of the first block copolymer in the polymer blend isselected from the range of 1% to 99%, optionally for some applicationsselected from the range of 20% to 80%, optionally for some applicationsselected from the range of 40% to 60%. In an embodiment, for example,the second component is selected from the group consisting of a solvent,ceramic, metal, metal oxide, liquid, silicon, or semiconductor. In anembodiment, for example, is physically associated with the first polymerblock, the second polymer block or both of the first block copolymer. Inan embodiment, for example, the second component is a solvent resultingin swelling of one or more domains of the structure. In an embodiment,for example, the second component is a homopolymer or a randomcopolymer.

In an embodiment, for example, the second component is a second blockcopolymer comprising at least one polymer block different from the firstpolymer block and the second polymer block of the first block copolymer.Useful block copolymers for the second component include any of theblock copolymers described herein, including block copolymers having anyof formulas (FX1a)-(FX10h), and all embodiments thereof. In anembodiment of this aspect, the ratio of the molecular weight of thefirst block copolymer to the molecular weight of the second blockcopolymer is less than or equal to 5, and optionally the ratio of themolecular weight of the first block copolymer to the molecular weight ofthe second block copolymer is selected over the range of 0.2 to 5. In anembodiment of this aspect, the second component is a polymer such as ablock copolymer having a molecular weight selected from 50 Da to 10,000Da. In an embodiment of this aspect, the second component is a polymercharacterized by 10 to 2000 repeating units. In an embodiment of thisaspect, the second component is a brush block copolymer or a wedge-typeblock copolymer. In an embodiment of this aspect, for example, thepolymer blend comprises a second polymer having a second block copolymercomprising at least one polymer block different from the first polymerblock and the second polymer block of the first block copolymer. In anembodiment, the polymer blend comprises a second polymer that is ahomopolymer. In another embodiment, the polymer blend comprises a secondpolymer that is a random copolymer, a block copolymer or a brush blockcopolymer, including any of the block copolymers and polymer blendsdisclosed herein.

In an embodiment of this aspect, the polymer blend comprises awedge-type first block copolymer having the formula (FX10a), (FX10b),(FX10c), (FX10d), (FX10e), (FX10f), (FX10g) or (FX10h):

wherein: J is a repeating group of the first polymer side chain group;G¹ is the first wedge group; G² is the second wedge group; G³ is a thirdwedge group and G⁴ is the third wedge group; R¹⁰ is independently apolymer side chain terminating group; and p is independently an integerselected from the range of 35 to 2000; and wherein J, R¹⁰, Q¹, Q², m,and n are as defined in connection with formula (FX1a-FX8b). Blockcopolymers for this aspect may comprise any of the wedge groups and/orpolymer side chain groups described herein.

In an embodiment of this aspect, the polymer blend comprises awedge-type first block copolymer having the formula (FX5a), (FX5b1) or(FX6b1):

wherein J is a repeating group of said first polymer side chain group, Kis a repeating group of said second polymer side chain group, G² is saidsecond wedge group; each of R¹⁰ and R¹¹ is independently a polymer sidechain terminating group; and each of p and q is independently an integerselected from the range of 30 to 2000, wherein J, K, p, q, R¹¹, R¹⁰, Q¹,Q², m, and n are as defined in connection with formula (FX1a-FX5b).

The invention provides structure comprising polymer blends, havingoptical properties that are tunable from the ultra-violet, through thevisible and to the IR regions of the electromagnetic spectrum byselection of the relative amounts or weights percentages of polymercomponents of the polymer blend, such as the relative amounts or eightspercentages of the block polymer components of the polymer blend.

In an embodiment, the invention provides copolymers, such as blockcopolymers, generated by polymerization of one or more substituted orunsubstituted norbornene monomers. In an embodiment, the inventionprovides copolymers, such as block copolymers, generated bypolymerization of one or more monomers selected from the groupconsisting of:

wherein each Bn is independently a substituted or unsubstituted benzylgroup and wherein each R is independently a hydrogen, C₁-C₃₀ alkyl,C₃-C₃₀ cycloalkyl, C₅-C₃₀ aryl, C₅-C₃₀ heteroaryl, C₁-C₃₀ acyl, C₁-C₃₀hydroxyl, C₁-C₃₀ alkoxy, C₂-C₃₀ alkenyl, C₂-C₃₀ alkynyl, C₅-C₃₀alkylaryl, —CO₂R³⁰, —CONR³¹R³², —COR³³, —SOR³⁴, —OSR³⁵, —SO₂R³⁶, —OR³⁷,—SR³⁸, —NR³⁹R⁴⁰, —NR⁴¹COR⁴², C₁-C₃₀ alkyl halide, phosphonate,phosphonic acid, silane, siloxane, silsesquioxane, C₂-C₃₀ halocarbonchain, C₂-C₃₀ perfluorocarbon, or C₂-C₃₀ polyethylene glycol; whereineach of R³⁰-R⁴² is independently hydrogen, C₅-C₁₀ aryl or C₁-C₁₀ alkyl.

In another aspect the invention provides a method of modulating incidentelectromagnetic radiation; the method comprising: providing a structurecomprising a supramolecular assembly of a plurality of block copolymers;wherein each of the block copolymers independently comprises: (i) afirst polymer block comprising at least 10 first repeating units;wherein each of the first repeating units of the first polymer blockcomprises a first polymer backbone group directly or indirectlycovalently linked to a first polymer side chain group having a helicalsecondary structure, wherein each of the first polymer side chain groupsof the first polymer block independently comprises a number of repeatingunits greater than or equal to 10; and (ii) a second polymer blockcomprising at least 10 second repeating units; wherein each of thesecond repeating units of the second polymer block comprises a secondpolymer backbone group covalently linked to a second polymer side chaingroup that is different than the first polymer side chain group or afirst wedge group; wherein the first and second repeating units aredirectly or indirectly covalently linked along a backbone of the blockcopolymer; and directing the incident electromagnetic radiation on tothe structure.

In another aspect the invention provides a method of modulating anincident electromagnetic radiation; the method comprising: providing astructure comprising a supramolecular assembly of a polymer blend of atleast one block copolymer and at least one second component; wherein thepolymer blend comprises: (i) a first block copolymer comprising: a firstpolymer block comprising at least 10 first repeating units; wherein eachof the first repeating units of the first polymer block comprises afirst polymer backbone group covalently linked to a first polymer sidechain group or a first wedge group; and a second polymer blockcomprising at least 10 second repeating units; wherein each of thesecond repeating units of the second polymer block comprises a secondpolymer backbone group covalently linked to a second polymer side chaingroup or second wedge group that is different than the first polymerside chain group and the first wedge group; wherein the first and secondrepeating units are directly or indirectly covalently linked along abackbone of the block copolymer; and (ii) the second component that isdifferent from the first block copolymer; the second componentcomprising a homopolymer, a copolymer, an oligomer, a small molecule orparticle; and directing the incident electromagnetic radiation on to thestructure.

Methods of this aspect of the invention include methods wherein theoptical transmission or reflectance of the structure is tunable byselection of the composition or molecular weight of block copolymercomponents of supramolecular assembly. Methods of this aspect of theinvention include methods wherein the optical transmission orreflectance of the structure is tunable by selection of the compositionor molecular weight of components of the polymer blend. In anembodiment, for example, the relative weight percentages of the firstblock copolymer component and second component are selected to providetunable transmission or reflectance properties of the UV, visible and/ornear IR regions of the electromagnetic spectrum.

Without wishing to be bound by any particular theory, there may bediscussion herein of beliefs or understandings of underlying principlesrelating to the devices and methods disclosed herein. It is recognizedthat regardless of the ultimate correctness of any mechanisticexplanation or hypothesis, an embodiment of the invention cannonetheless be operative and useful.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1. (a) Structures of isocyanate-based macromonomers and their ROMPto brush block copolymers. (b) Schematic representation of the synthesisof brush block copolymers from rigid-rod helical macromonomers and theirself-assembly towards 1D photonic crystals. (c) Photograph of photoniccrystals reflecting violet, green, and red light.

FIG. 2. (a) Plot of M_(w) and PDI as a function of MM-1 conversion([MM-1]:[1]=50:1). (b) Semi-logarithmic plots of In([MM-1₀]/[MM-1_(r)])as a function of time for the ROMP of MM-1 by 1. Conditions: [MM-1]=9.81mM; [1]=19.7 μM (□), 9.85 μM (▴), 6.57 μM (), or 3.94 μM (♦).Polymerizations performed in THF at ambient temperature.

FIG. 3. (a) Plot of reflectance as a function of wavelength forisocyanate-based brush BCP thin films with M_(w)=1512 (blue), 2918(green), 4167 (red), 5319 (purple), and 7119 (black) kDa. (b) Plot ofλ_(max) as a function of M_(w). Color scheme corresponding to M_(w) isconsistent with (a).

FIG. 4. SEM images of cross-sections of brush block copolymers withM_(w)=1512 (a), 2918 (b), 4167 (c), and 5319 (d) kDA. The perspectiveplaces the glass substrate parallel with the text.

FIG. 5. Plot of reflectance as a function of wavelength forisocyanate-based brush BCP thin films with M_(w)=1512 (blue), 2918(green), 4167 (red), 5319 (purple), and 7119 (black) kDa (solid), andthe corresponding simulated spectra (dashed).

FIG. 6. Structures and molecular weight properties of macromonomers andbrush block copolymers utilized in this Example 2.

FIG. 7. Photograph of brush block copolymer blends reflecting lightacross the visible spectrum (top). Plots of reflectance vs. wavelength(bottom-left) and maximum peak wavelength of reflectance vs. weightfraction of blend (% BCP-2, bottom-right) of the different blockcopolymer blends.

FIG. 8. SEM images of cross-sections of block copolymer blends with 0%(top-right), 30% (top-right), 80% (bottom-left), and 100% (bottom-right)of BCP-2. Perspective places the glass substrate parallel with the text.

FIG. 9. Structure of wedge-type block copolymers.

FIG. 10. Plot of reflectance as a function of wavelength of thedendronized BCP blends. Insert represent linear correlation betweenweight fraction and wavelength of reflectance.

FIG. 11. SEM images of cross-sections of dendronized BCPs with 25% and50% of polymer with M_(w)=1250 kDa.

FIG. 12. Structures of brush block copolymer, linear polystyrene, andpolynorbornene-graft-polystyrene.

FIG. 13. A. Scanning electron micrograph of a thin film of a brush blockcopolymer constructed from polyhexyl isocyanate and polystyrenemacromonomers showing stacked lamellar morphology. B. Absorbancespectrum showing the film reflects around 400 nm light.

FIG. 14. Scanning electron micrograph of a thin film of blends of abrush block copolymer constructed from polyhexyl isocyanate andpolystyrene macromonomers and linear polystyrene at 100 (A), 35 (B), and15 (C) % brush block copolymer demonstrating the morphology evolution.Absorbance spectrum showing the light reflecting properties of the filmscan be altered introducing greater percentage of linear polystyrene.

FIG. 15. A. Scanning electron micrograph of a thin film of blends of abrush block copolymer constructed from polyhexyl isocyanate andpolystyrene macromonomers and polynorbornene-graft-polystyrene at 35(A), 27 (B), and 15 (C) % brush block copolymer demonstrating themorphology evolution. Absorbance spectrum showing the light reflectingproperties of the films can be altered introducing greater percentage ofpolynorbornene-graft-polystyrene.

STATEMENTS REGARDING CHEMICAL COMPOUNDS AND NOMENCLATURE

In an embodiment, a composition or compound of the invention is isolatedor purified. In an embodiment, an isolated or purified compound is atleast partially isolated or purified as would be understood in the art.In an embodiment, the composition or compound of the invention has achemical purity of at least 95%, optionally for some applications atleast 99%, optionally for some applications at least 99.9%, optionallyfor some applications at least 99.99%, and optionally for someapplications at least 99.999% pure.

As used herein, the term “polymer” refers to a molecule composed ofrepeating structural units connected by covalent chemical bonds oftencharacterized by a substantial number of repeating units (e.g., equal toor greater than 10 repeating units and often equal to or greater than 50repeating units and often equal to or greater than 100 repeating units)and a high molecular weight (e.g. greater than or equal to 50,000 Da).Polymers are commonly the polymerization product of one or more monomerprecursors. The term polymer includes homopolymers, or polymersconsisting essentially of a single repeating monomer subunit. The termpolymer also includes copolymers which are formed when two or moredifferent types of monomers are linked in the same polymer. Copolymersmay comprise two or more monomer subunits, and include random, block,alternating, segmented, grafted, tapered and other copolymers. Usefulpolymers include organic polymers or inorganic polymers that may be inamorphous, semi-amorphous, crystalline or partially crystalline states.Cross linked polymers having linked monomer chains are useful for someapplications.

An “oligomer” refers to a molecule composed of repeating structuralunits connected by covalent chemical bonds often characterized by anumber of repeating units less than that of a polymer (e.g., equal to orless than 10 repeating units) and a lower molecular weights (e.g. lessthan or equal to 50,000 Da) than polymers. Oligomers may be thepolymerization product of one or more monomer precursors.

“Block copolymers” are a type of copolymer comprising blocks orspatially segregated domains, wherein different domains comprisedifferent polymerized monomers, for example, including at least twochemically distinguishable blocks. Block copolymers may further compriseone or more other structural domains, such as hydrophobic groups,hydrophilic groups, etc. In a block copolymer, adjacent blocks areconstitutionally different, i.e. adjacent blocks comprise constitutionalunits derived from different species of monomer or from the same speciesof monomer but with a different composition or sequence distribution ofconstitutional units. Different blocks (or domains) of a block copolymermay reside on different ends or the interior of a polymer (e.g. [A][B]),or may be provided in a selected sequence ([A][B][A][B]). “Diblockcopolymer” refers to block copolymer having two different chemicalblocks.

“Polymer backbone group” refers to groups that are covalently linked tomake up a backbone of a polymer, such as a block copolymer. Polymerbackbone groups may be linked to side chain groups, such as wedge groupsand polymer side chain groups. Some polymer backbone groups useful inthe present compositions are derived from polymerization of a monomerselected from the group consisting of a substituted or unsubstitutednorbornene, olefin, cyclic olefin, norbornene anhydride, cyclooctene,cyclopentadiene, styrene and acrylate. Some polymer backbone groupsuseful in the present compositions are obtained from a ring openingmetathesis polymerization (ROMP) reaction. Polymer backbones mayterminate in a range of backbone terminating groups including hydrogen,C₁-C₁₀ alkyl, C₃-C₁₀ cycloalkyl, C₅-C₁₀ aryl, C₅-C₁₀ heteroaryl, C₁-C₁₀acyl, C₁-C₁₀ hydroxyl, C₁-C₁₀ alkoxy, C₂-C₁₀ alkenyl, C₂-C₁₀ alkynyl,C₅-C₁₀ alkylaryl, —CO₂R³⁰, —CONR³¹R³², —COR³³, —SOR³⁴, —OSR³⁵, —SO₂R³⁶,—OR³⁷, —SR³⁸, —NR³⁹R⁴⁰, —NR⁴¹COR⁴², C₁-C₁₀ alkyl halide, phosphonate,phosphonic acid, silane, siloxane, acrylate, or catechol; wherein eachof R³⁰-R⁴² is independently hydrogen, C₁-C₁₀ alkyl or C₅-C₁₀ aryl.

“Wedge group” refers to a group covalently linked to a polymer backbonegroup that comprises a branched moiety, optionally imparting stericproperties to the polymer. In an embodiment, for example, a wedge groupis characterized by at least two branch points, optionally at leastthree, each terminating in an independent terminating branch moietycomprising at least 4 atoms, and optionally at least 10 atoms, andoptionally at least 20 atoms and optionally at least 50 atoms. A wedgegroup may be directly or indirectly linked to the polymer back bonegroup. In some embodiments, wedge groups provide steric bulk and/orinteractions that result in an extended polymer backbone and/or a rigidpolymer backbone.

“Wedge-type block copolymer” refers a block copolymer that comprises atleast one polymer block comprising wedge groups directly or indirectlylinked to the polymer backbone. Wedge-type block copolymers includebrush block copolymers having at least one polymer block comprisingwedge groups directly or indirectly linked to a polymer back bone and atleast one polymer block comprising polymer side chain groups directly orindirectly linked to a polymer back bone.

“Polymer side chain group” refers to a group covalently linked to apolymer backbone group that comprises a polymer side chain, optionallyimparting steric properties to the polymer. In an embodiment, forexample, a polymer side chain group is characterized by a plurality ofrepeating units having the same, or similar, chemical composition. Apolymer side chain group may be directly or indirectly linked to thepolymer back bone groups. In some embodiments, polymer side chain groupsprovide steric bulk and/or interactions that result in an extendedpolymer backbone and/or a rigid polymer backbone. Some polymer sidechain groups useful in the present compositions include unsubstituted orsubstituted unsubstituted or substituted polyisocyanate group,polymethacrylate group, polyacrylate group, polymethacrylamide group,polyacrylamide group, polyquinoxaline group, polyguanidine group,polysilane group, polyacetylene group, polyamino acid group, polypeptidegroup, polychloral group, polylactide group, polystyrene group,polyacrylate group, poly tert-butyl acrylate group, polymethylmethacrylate group, polysiloxane group, polydimethylsiloxane group, polyn-butyl acrylate group, polyethylene glycol group, polyethylene oxidegroup, polyethylene group, polypropylene group, polytetrafluoroethylenegroup, and polyvinyl chloride group. Some polymer side chain groupsuseful in the present compositions comprise repeating units obtained viaanionic polymerization, cationic polymerization, free radicalpolymerization, group transfer polymerization, or ring-openingpolymerization. A polymer side chain may terminate in a wide range ofpolymer side chain terminating groups including hydrogen, C₁-C₁₀ alkyl,C₃-C₁₀ cycloalkyl, C₅-C₁₀ aryl, C₅-C₁₀ heteroaryl, C₁-C₁₀ acyl, C₁-C₁₀hydroxyl, C₁-C₁₀ alkoxy, C₂-C₁₀ alkenyl, C₂-C₁₀ alkynyl, C₅-C₁₀alkylaryl, —CO₂R³⁰, —CONR³¹R³², —COR³³, —SOR³⁴, —OSR³⁵, —SO₂R³⁶, —OR³⁷,—SR³⁸, —NR³⁹R⁴⁰, —NR⁴¹COR⁴², C₁-C₁₀ alkyl halide, phosphonate,phosphonic acid, silane, siloxane acrylate, or catechol; wherein each ofR³⁰-R⁴² is independently hydrogen or C₁-C₅ alkyl.

“Polymer blend” refers to a mixture comprising at least one polymer,such as a block copolymer, and at least one additional component, andoptionally more than one additional component. In some embodiments, forexample, a polymer blend of the invention comprises a first blockcopolymer and one or more additional component comprising a homopolymer,a copolymer, a block copolymer, a brush block copolymer, an oligomer, asolvent, a metal, a metal oxide, a ceramic, a liquid, a small molecule(e.g., molecular weight less than 500 Da, optionally less than 100 Da),a particle or any combination of these. Polymer blends useful for someapplications comprise a first block copolymer, such as a brush blockcopolymer or a wedge-type block copolymer, and one or more additionalcomponents comprising block copolymers, brush block copolymers,wedge-type block copolymers, linear block copolymers, random copolymers,homopolymers, or any combinations of these. Polymer blends of theinvention include mixture of two, three, four, five and more components.

As used herein, the term “group” may refer to a functional group of achemical compound. Groups of the present compounds refer to an atom or acollection of atoms that are a part of the compound. Groups of thepresent invention may be attached to other atoms of the compound via oneor more covalent bonds. Groups may also be characterized with respect totheir valence state. The present invention includes groups characterizedas monovalent, divalent, trivalent, etc. valence states.

As used herein, the term “substituted” refers to a compound wherein ahydrogen is replaced by another functional group.

As is customary and well known in the art, hydrogen atoms in formulas(FX1a)-(FX10h) and (W1)-(W10) are not always explicitly shown, forexample, hydrogen atoms bonded to the carbon atoms of aromatic,heteroaromatic, and alicyclic rings are not always explicitly shown informulas (FX1a)-(FX10h) and (W1)-(W10). The structures provided herein,for example in the context of the description of formulas (FX1a)-(FX10h)and (W1)-(W10) and schematics and structures in the drawings, areintended to convey to one of reasonable skill in the art the chemicalcomposition of compounds of the methods and compositions of theinvention, and as will be understood by one of skill in the art, thestructures provided do not indicate the specific positions and/ororientations of atoms and the corresponding bond angles between atoms ofthese compounds.

As used herein, the terms “alkylene” and “alkylene group” are usedsynonymously and refer to a divalent group derived from an alkyl groupas defined herein. The invention includes compounds having one or morealkylene groups. Alkylene groups in some compounds function as linkingand/or spacer groups. Compounds of the invention may have substitutedand/or unsubstituted C₁-C₂₀ alkylene, C₁-C₁₀ alkylene and C₁-C₅ alkylenegroups, for example, as one or more linking groups (e.g. L¹-L⁴ and/orW¹-W⁵).

As used herein, the terms “cycloalkylene” and “cycloalkylene group” areused synonymously and refer to a divalent group derived from acycloalkyl group as defined herein. The invention includes compoundshaving one or more cycloalkylene groups. Cycloalkyl groups in somecompounds function as linking and/or spacer groups. Compounds of theinvention may have substituted and/or unsubstituted C₃-C₂₀cycloalkylene, C₃-C₁₀ cycloalkylene and C₃-C₅ cycloalkylene groups, forexample, as one or more linking groups (e.g. L¹-L⁴ and/or W¹-W⁵).

As used herein, the terms “arylene” and “arylene group” are usedsynonymously and refer to a divalent group derived from an aryl group asdefined herein. The invention includes compounds having one or morearylene groups. In some embodiments, an arylene is a divalent groupderived from an aryl group by removal of hydrogen atoms from twointra-ring carbon atoms of an aromatic ring of the aryl group. Arylenegroups in some compounds function as linking and/or spacer groups.Arylene groups in some compounds function as chromophore, fluorophore,aromatic antenna, dye and/or imaging groups. Compounds of the inventioninclude substituted and/or unsubstituted C₃-C₃₀ arylene, C₃-C₂₀ arylene,C₃-C₁₀ arylene and C₁-C₅ arylene groups, for example, as one or morelinking groups (e.g. L¹-L⁴ and/or W¹-W⁵).

As used herein, the terms “heteroarylene” and “heteroarylene group” areused synonymously and refer to a divalent group derived from aheteroaryl group as defined herein. The invention includes compoundshaving one or more heteroarylene groups. In some embodiments, aheteroarylene is a divalent group derived from a heteroaryl group byremoval of hydrogen atoms from two intra-ring carbon atoms or intra-ringnitrogen atoms of a heteroaromatic or aromatic ring of the heteroarylgroup. Heteroarylene groups in some compounds function as linking and/orspacer groups. Heteroarylene groups in some compounds function aschromophore, aromatic antenna, fluorophore, dye and/or imaging groups.Compounds of the invention include substituted and/or unsubstitutedC₃-C₃₀ heteroarylene, C₃-C₂₀ heteroarylene, C₁-C₁₀ heteroarylene andC₃-C₅ heteroarylene groups, for example, as one or more linking groups(e.g. L¹-L⁴ and/or W¹-W⁵).

As used herein, the terms “alkenylene” and “alkenylene group” are usedsynonymously and refer to a divalent group derived from an alkenyl groupas defined herein. The invention includes compounds having one or morealkenylene groups. Alkenylene groups in some compounds function aslinking and/or spacer groups. Compounds of the invention includesubstituted and/or unsubstituted C₂-C₂₀ alkenylene, C₂-C₁₀ alkenyleneand C₂-C₅ alkenylene groups, for example, as one or more linking groups(e.g. L¹-L⁴ and/or W¹-W⁵).

As used herein, the terms “cylcoalkenylene” and “cylcoalkenylene group”are used synonymously and refer to a divalent group derived from acylcoalkenyl group as defined herein. The invention includes compoundshaving one or more cylcoalkenylene groups. Cycloalkenylene groups insome compounds function as linking and/or spacer groups. Compounds ofthe invention include substituted and/or unsubstituted C₃-C₂₀cylcoalkenylene, C₃-C₁₀ cylcoalkenylene and C₃-C₅ cylcoalkenylenegroups, for example, as one or more linking groups (e.g. L¹-L⁴ and/orW¹-W⁵).

As used herein, the terms “alkynylene” and “alkynylene group” are usedsynonymously and refer to a divalent group derived from an alkynyl groupas defined herein. The invention includes compounds having one or morealkynylene groups. Alkynylene groups in some compounds function aslinking and/or spacer groups. Compounds of the invention includesubstituted and/or unsubstituted C₂-C₂₀ alkynylene, C₂-C₁₀ alkynyleneand C₂-C₅ alkynylene groups, for example, as one or more linking groups(e.g. L¹-L⁴ and/or W¹-W⁵).

As used herein, the term “halo” refers to a halogen group such as afluoro (—F), chloro (—Cl), bromo (—Br), iodo (—I) or astato (—At).

The term “heterocyclic” refers to ring structures containing at leastone other kind of atom, in addition to carbon, in the ring. Examples ofsuch heteroatoms include nitrogen, oxygen and sulfur. Heterocyclic ringsinclude heterocyclic alicyclic rings and heterocyclic aromatic rings.Examples of heterocyclic rings include, but are not limited to,pyrrolidinyl, piperidyl, imidazolidinyl, tetrahydrofuryl,tetrahydrothienyl, furyl, thienyl, pyridyl, quinolyl, isoquinolyl,pyridazinyl, pyrazinyl, indolyl, imidazolyl, oxazolyl, thiazolyl,pyrazolyl, pyridinyl, benzoxadiazolyl, benzothiadiazolyl, triazolyl andtetrazolyl groups. Atoms of heterocyclic rings can be bonded to a widerange of other atoms and functional groups, for example, provided assubstituents.

The term “carbocyclic” refers to ring structures containing only carbonatoms in the ring. Carbon atoms of carbocyclic rings can be bonded to awide range of other atoms and functional groups, for example, providedas substituents.

The term “alicyclic ring” refers to a ring, or plurality of fused rings,that is not an aromatic ring. Alicyclic rings include both carbocyclicand heterocyclic rings.

The term “aromatic ring” refers to a ring, or a plurality of fusedrings, that includes at least one aromatic ring group. The term aromaticring includes aromatic rings comprising carbon, hydrogen andheteroatoms. Aromatic ring includes carbocyclic and heterocyclicaromatic rings. Aromatic rings are components of aryl groups.

The term “fused ring” or “fused ring structure” refers to a plurality ofalicyclic and/or aromatic rings provided in a fused ring configuration,such as fused rings that share at least two intra ring carbon atomsand/or heteroatoms.

As used herein, the term “alkoxyalkyl” refers to a substituent of theformula alkyl-O-alkyl.

As used herein, the term “polyhydroxyalkyl” refers to a substituenthaving from 2 to 12 carbon atoms and from 2 to 5 hydroxyl groups, suchas the 2,3-dihydroxypropyl, 2,3,4-trihydroxybutyl or2,3,4,5-tetrahydroxypentyl residue.

As used herein, the term “polyalkoxyalkyl” refers to a substituent ofthe formula alkyl-(alkoxy)_(n)-alkoxy wherein n is an integer from 1 to10, preferably 1 to 4, and more preferably for some embodiments 1 to 3.

Amino acids include glycine, alanine, valine, leucine, isoleucine,methionine, proline, phenylalanine, tryptophan, asparagine, glutamine,glycine, serine, threonine, serine, rhreonine, asparagine, glutamine,tyrosine, cysteine, lysine, arginine, histidine, aspartic acid andglutamic acid. As used herein, reference to “a side chain residue of anatural α-amino acid” specifically includes the side chains of theabove-referenced amino acids. Peptides are comprised of two or moreamino-acid connected via peptide bonds.

Alkyl groups include straight-chain, branched and cyclic alkyl groups.Alkyl groups include those having from 1 to 30 carbon atoms. Alkylgroups include small alkyl groups having 1 to 3 carbon atoms. Alkylgroups include medium length alkyl groups having from 4-10 carbon atoms.Alkyl groups include long alkyl groups having more than 10 carbon atoms,particularly those having 10-30 carbon atoms. The term cycloalkylspecifically refers to an alky group having a ring structure such asring structure comprising 3-30 carbon atoms, optionally 3-20 carbonatoms and optionally 2-10 carbon atoms, including an alkyl group havingone or more rings. Cycloalkyl groups include those having a 3-, 4-, 5-,6-, 7-, 8-, 9- or 10-member carbon ring(s) and particularly those havinga 3-, 4-, 5-, 6-, or 7-member ring(s). The carbon rings in cycloalkylgroups can also carry alkyl groups. Cycloalkyl groups can includebicyclic and tricycloalkyl groups. Alkyl groups are optionallysubstituted. Substituted alkyl groups include among others those whichare substituted with aryl groups, which in turn can be optionallysubstituted. Specific alkyl groups include methyl, ethyl, n-propyl,iso-propyl, cyclopropyl, n-butyl, s-butyl, t-butyl, cyclobutyl,n-pentyl, branched-pentyl, cyclopentyl, n-hexyl, branched hexyl, andcyclohexyl groups, all of which are optionally substituted. Substitutedalkyl groups include fully halogenated or semihalogenated alkyl groups,such as alkyl groups having one or more hydrogens replaced with one ormore fluorine atoms, chlorine atoms, bromine atoms and/or iodine atoms.Substituted alkyl groups include fully fluorinated or semifluorinatedalkyl groups, such as alkyl groups having one or more hydrogens replacedwith one or more fluorine atoms. An alkoxy group is an alkyl group thathas been modified by linkage to oxygen and can be represented by theformula R—O and can also be referred to as an alkyl ether group.Examples of alkoxy groups include, but are not limited to, methoxy,ethoxy, propoxy, butoxy and heptoxy. Alkoxy groups include substitutedalkoxy groups wherein the alky portion of the groups is substituted asprovided herein in connection with the description of alkyl groups. Asused herein MeO— refers to CH₃O—. Compositions of some embodiments ofthe invention comprise alkyl groups as terminating groups, such aspolymer backbone terminating groups and/or polymer side chainterminating groups.

Alkenyl groups include straight-chain, branched and cyclic alkenylgroups. Alkenyl groups include those having 1, 2 or more double bondsand those in which two or more of the double bonds are conjugated doublebonds. Alkenyl groups include those having from 2 to 20 carbon atoms.Alkenyl groups include small alkenyl groups having 2 to 3 carbon atoms.Alkenyl groups include medium length alkenyl groups having from 4-10carbon atoms. Alkenyl groups include long alkenyl groups having morethan 10 carbon atoms, particularly those having 10-20 carbon atoms.Cycloalkenyl groups include those in which a double bond is in the ringor in an alkenyl group attached to a ring. The term cycloalkenylspecifically refers to an alkenyl group having a ring structure,including an alkenyl group having a 3-, 4-, 5-, 6-, 7-, 8-, 9- or10-member carbon ring(s) and particularly those having a 3-, 4-, 5-, 6-or 7-member ring(s). The carbon rings in cycloalkenyl groups can alsocarry alkyl groups. Cycloalkenyl groups can include bicyclic andtricyclic alkenyl groups. Alkenyl groups are optionally substituted.Substituted alkenyl groups include among others those which aresubstituted with alkyl or aryl groups, which groups in turn can beoptionally substituted. Specific alkenyl groups include ethenyl,prop-1-enyl, prop-2-enyl, cycloprop-1-enyl, but-1-enyl, but-2-enyl,cyclobut-1-enyl, cyclobut-2-enyl, pent-1-enyl, pent-2-enyl, branchedpentenyl, cyclopent-1-enyl, hex-1-enyl, branched hexenyl, cyclohexenyl,all of which are optionally substituted. Substituted alkenyl groupsinclude fully halogenated or semihalogenated alkenyl groups, such asalkenyl groups having one or more hydrogens replaced with one or morefluorine atoms, chlorine atoms, bromine atoms and/or iodine atoms.Substituted alkenyl groups include fully fluorinated or semifluorinatedalkenyl groups, such as alkenyl groups having one or more hydrogen atomsreplaced with one or more fluorine atoms. Compositions of someembodiments of the invention comprise alkenyl groups as terminatinggroups, such as polymer backbone terminating groups and/or polymer sidechain terminating groups.

Aryl groups include groups having one or more 5-, 6- or 7-memberaromatic rings, including heterocyclic aromatic rings. The termheteroaryl specifically refers to aryl groups having at least one 5-, 6-or 7-member heterocyclic aromatic rings. Aryl groups can contain one ormore fused aromatic rings, including one or more fused heteroaromaticrings, and/or a combination of one or more aromatic rings and one ormore nonaromatic rings that may be fused or linked via covalent bonds.Heterocyclic aromatic rings can include one or more N, O, or S atoms inthe ring. Heterocyclic aromatic rings can include those with one, two orthree N atoms, those with one or two O atoms, and those with one or twoS atoms, or combinations of one or two or three N, O or S atoms. Arylgroups are optionally substituted. Substituted aryl groups include amongothers those which are substituted with alkyl or alkenyl groups, whichgroups in turn can be optionally substituted. Specific aryl groupsinclude phenyl, biphenyl groups, pyrrolidinyl, imidazolidinyl,tetrahydrofuryl, tetrahydrothienyl, furyl, thienyl, pyridyl, quinolyl,isoquinolyl, pyridazinyl, pyrazinyl, indolyl, imidazolyl, oxazolyl,thiazolyl, pyrazolyl, pyridinyl, benzoxadiazolyl, benzothiadiazolyl, andnaphthyl groups, all of which are optionally substituted. Substitutedaryl groups include fully halogenated or semihalogenated aryl groups,such as aryl groups having one or more hydrogens replaced with one ormore fluorine atoms, chlorine atoms, bromine atoms and/or iodine atoms.Substituted aryl groups include fully fluorinated or semifluorinatedaryl groups, such as aryl groups having one or more hydrogens replacedwith one or more fluorine atoms. Aryl groups include, but are notlimited to, aromatic group-containing or heterocylic aromaticgroup-containing groups corresponding to any one of the following:benzene, naphthalene, naphthoquinone, diphenylmethane, fluorene,anthracene, anthraquinone, phenanthrene, tetracene, tetracenedione,pyridine, quinoline, isoquinoline, indoles, isoindole, pyrrole,imidazole, oxazole, thiazole, pyrazole, pyrazine, pyrimidine, purine,benzimidazole, furans, benzofuran, dibenzofuran, carbazole, acridine,acridone, phenanthridine, thiophene, benzothiophene, dibenzothiophene,xanthene, xanthone, flavone, coumarin, azulene or anthracycline. As usedherein, a group corresponding to the groups listed above expresslyincludes an aromatic or heterocyclic aromatic group, includingmonovalent, divalent and polyvalent groups, of the aromatic andheterocyclic aromatic groups listed herein are provided in a covalentlybonded configuration in the compounds of the invention at any suitablepoint of attachment. In embodiments, aryl groups contain between 5 and30 carbon atoms. In embodiments, aryl groups contain one aromatic orheteroaromatic six-membered ring and one or more additional five- orsix-membered aromatic or heteroaromatic ring. In embodiments, arylgroups contain between five and eighteen carbon atoms in the rings. Arylgroups optionally have one or more aromatic rings or heterocyclicaromatic rings having one or more electron donating groups, electronwithdrawing groups and/or targeting ligands provided as substituents.Compositions of some embodiments of the invention comprise aryl groupsas terminating groups, such as polymer backbone terminating groupsand/or polymer side chain terminating groups.

Arylalkyl groups are alkyl groups substituted with one or more arylgroups wherein the alkyl groups optionally carry additional substituentsand the aryl groups are optionally substituted. Specific alkylarylgroups are phenyl-substituted alkyl groups, e.g., phenylmethyl groups.Alkylaryl groups are alternatively described as aryl groups substitutedwith one or more alkyl groups wherein the alkyl groups optionally carryadditional substituents and the aryl groups are optionally substituted.Specific alkylaryl groups are alkyl-substituted phenyl groups such asmethylphenyl. Substituted arylalkyl groups include fully halogenated orsemihalogenated arylalkyl groups, such as arylalkyl groups having one ormore alkyl and/or aryl groups having one or more hydrogens replaced withone or more fluorine atoms, chlorine atoms, bromine atoms and/or iodineatoms. Compositions of some embodiments of the invention comprisearylalkyl groups as terminating groups, such as polymer backboneterminating groups and/or polymer side chain terminating groups.

As to any of the groups described herein which contain one or moresubstituents, it is understood that such groups do not contain anysubstitution or substitution patterns which are sterically impracticaland/or synthetically non-feasible. Optional substitution of alkyl groupsincludes substitution with one or more alkenyl groups, aryl groups orboth, wherein the alkenyl groups or aryl groups are optionallysubstituted. Optional substitution of alkenyl groups includessubstitution with one or more alkyl groups, aryl groups, or both,wherein the alkyl groups or aryl groups are optionally substituted.Optional substitution of aryl groups includes substitution of the arylring with one or more alkyl groups, alkenyl groups, or both, wherein thealkyl groups or alkenyl groups are optionally substituted.

Optional substituents for any alkyl, alkenyl and aryl group includessubstitution with one or more of the following substituents, amongothers:

halogen, including fluorine, chlorine, bromine or iodine;

pseudohalides, including —CN;

-   -   —COOR where R is a hydrogen or an alkyl group or an aryl group        and more specifically where R is a methyl, ethyl, propyl, butyl,        or phenyl group all of which groups are optionally substituted;    -   —COR where R is a hydrogen or an alkyl group or an aryl group        and more specifically where R is a methyl, ethyl, propyl, butyl,        or phenyl group all of which groups are optionally substituted;    -   —CON(R)₂ where each R, independently of each other R, is a        hydrogen or an alkyl group or an aryl group and more        specifically where R is a methyl, ethyl, propyl, butyl, or        phenyl group all of which groups are optionally substituted; and        where R and R can form a ring which can contain one or more        double bonds and can contain one or more additional carbon        atoms;    -   —OCON(R)₂ where each R, independently of each other R, is a        hydrogen or an alkyl group or an aryl group and more        specifically where R is a methyl, ethyl, propyl, butyl, or        phenyl group all of which groups are optionally substituted; and        where R and R can form a ring which can contain one or more        double bonds and can contain one or more additional carbon        atoms;    -   —N(R)₂ where each R, independently of each other R, is a        hydrogen, or an alkyl group, or an acyl group or an aryl group        and more specifically where R is a methyl, ethyl, propyl, butyl,        phenyl or acetyl group, all of which are optionally substituted;        and where R and R can form a ring which can contain one or more        double bonds and can contain one or more additional carbon        atoms;    -   —SR, where R is hydrogen or an alkyl group or an aryl group and        more specifically where R is hydrogen, methyl, ethyl, propyl,        butyl, or a phenyl group, which are optionally substituted;

—SO₂R, or —SOR where R is an alkyl group or an aryl group and morespecifically where R is a methyl, ethyl, propyl, butyl, or phenyl group,all of which are optionally substituted;

-   -   —OCOOR where R is an alkyl group or an aryl group;    -   —SO₂N(R)₂ where each R, independently of each other R, is a        hydrogen, or an alkyl group, or an aryl group all of which are        optionally substituted and wherein R and R can form a ring which        can contain one or more double bonds and can contain one or more        additional carbon atoms;    -   —OR where R is H, an alkyl group, an aryl group, or an acyl        group all of which are optionally substituted. In a particular        example R can be an acyl yielding—OCOR″ where R″ is a hydrogen        or an alkyl group or an aryl group and more specifically where        R″ is methyl, ethyl, propyl, butyl, or phenyl groups all of        which groups are optionally substituted.

Specific substituted alkyl groups include haloalkyl groups, particularlytrihalomethyl groups and specifically trifluoromethyl groups. Specificsubstituted aryl groups include mono-, di-, tri, tetra- andpentahalo-substituted phenyl groups; mono-, di-, tri-, tetra-, penta-,hexa-, and hepta-halo-substituted naphthalene groups; 3- or4-halo-substituted phenyl groups, 3- or 4-alkyl-substituted phenylgroups, 3- or 4-alkoxy-substituted phenyl groups, 3- or4-RCO-substituted phenyl, 5- or 6-halo-substituted naphthalene groups.More specifically, substituted aryl groups include acetylphenyl groups,particularly 4-acetylphenyl groups; fluorophenyl groups, particularly3-fluorophenyl and 4-fluorophenyl groups; chlorophenyl groups,particularly 3-chlorophenyl and 4-chlorophenyl groups; methylphenylgroups, particularly 4-methylphenyl groups; and methoxyphenyl groups,particularly 4-methoxyphenyl groups.

As to any of the above groups which contain one or more substituents, itis understood that such groups do not contain any substitution orsubstitution patterns which are sterically impractical and/orsynthetically non-feasible.

DETAILED DESCRIPTION OF THE INVENTION

In general, the terms and phrases used herein have their art-recognizedmeaning, which can be found by reference to standard texts, journalreferences and contexts known to those skilled in the art.

The invention is further detailed in the following Examples, which areoffered by way of illustration and are not intended to limit the scopeof the invention in any manner.

Example 1 Synthesis of Isocyanate-Based Brush Block Copolymers and theirRapid Self-Assembly to Infrared Reflecting Photonic Crystals Abstract

The synthesis of rigid-rod, helical isocyanate-based macromonomers wasachieved through the polymerization of hexyl isocyanate and4-phenylbutyl isocyanate, initiated by an exo-norbornene functionalizedhalf-titanocene complex. Sequential ruthenium-mediated ring-openingmetathesis polymerization of these macromonomers readily affordedwell-defined brush block copolymers, with precisely tunable molecularweights ranging from high (1512 kDa) to ultra-high (7119 kDa), whilemaintaining narrow molecular weight distributions (PDI=1.08-1.39). Theself-assembly of these brush block copolymers to solid-state thin-filmsand their photonic properties were investigated. Due to the rigidarchitecture of these novel polymeric materials, they rapidlyself-assemble through simple controlled evaporation to photonic crystalmaterials that reflect light from the UV, through the visible, to thenear infrared. The wavelength of reflectance is linearly related to thebrush block copolymer molecular weight, allowing for predictable tuningof the band gap through synthetic control of the polymer molecularweight. A combination of scanning electron microscopy and opticalmodeling were employed to explain the origin of reflectivity.

Introduction

Urbanization is causing a cascade of negative effects on theenvironment.¹ A readily apparent example on a local scale is the urbanheat island (UHI) effect, the phenomenon that urban areas often havehigher local temperatures than surrounding areas.² A major cause of UHIsis the absorption and thermalization of solar energy by modern buildingmaterials. A tremendous amount of money and energy is consumed towardscooling in these areas,³ resulting in increased pollution⁴ and degradedliving conditions.⁵ To minimize the negative effects of urbanization onthe environment, great efforts have been directed towards urban designand the development of new technologies. Because the majority of solarenergy is in the form of IR radiation, there is strong interest indeveloping IR-reflecting materials to prevent absorption andthermalization.

Photonic crystals (PCs) are periodic composite materials with frequencyspecific reflection, which can be tuned to efficiently reflect IRlight.⁶ In these materials, the propagation of certain wavelengths oflight is forbidden due to photonic band gaps that originate from theperiodic modulation of the dielectric function. The wavelength ofreflected light is related to the optical path length of the domains,which is determined by the size and refractive index of the components.PCs are most commonly synthesized through layer-by-layer depositions,lithography, or the self-assembly of colloidal crystals.⁶ Unfortunately,these routes are expensive or impractical as large area PCs; a moredesirable IR-reflective building material would be fabricatedinexpensively from a commodity material, such as a polymer. In thiscontext, the self-assembly of block copolymers (BCPs)⁷ provides anattractive means to IR-reflecting PCs because of their low costpotential in terms of both raw material and bottom-up fabrication viaself-assembly. However, most BCP PCs can only reflect short wavelengthsof visible light.^(8,9) This is because high molecular weight (MW)polymers, capable of forming large domains, exhibit extreme polymerchain entanglement that is detrimental to self-assembly and inhibits theformation of large, ordered morphologies. To overcome the inability ofutilizing high MW BCPs to form polymer PCs that reflect long wavelengthsof light, the domain sizes can be enlarged through swelling withadditives, namely solvent molecules¹⁰ or homopolymers,¹¹ although theseapproaches generally require complicated annealing procedures.

Brush BCPs can self-assemble to long-wavelength reflecting PCs withoutthe need for swelling agents.¹² By exploiting the advantageouscharacteristics (i.e. livingness, stability, as well as steric andfunctional group tolerance) of ruthenium (1) mediated ring-openingmetathesis polymerization (ROMP)¹³ we were able to synthesizewell-defined brush BCPs constructed from lactide- andstyrene-macromonomers (MMs).^(12,14) This “grafting-through”polymerization strategy of MMs affords highly uniform brush BCPs,¹⁵where the sterically encumbered array of low MW side-chains greatlyinhibits chain-entanglement and enforces the unifying main-chain toassume a highly elongated conformation.¹⁶ As a result, these brush BCPsrapidly self-assembled to stacked lamellae of alternating layers oflactide and styrene domains, forming 1D PC architectures. Throughcontrolled evaporation, the films exhibited a maximum peak wavelength(λ_(max)) of reflectance as long as 540 nm, while thermal annealingunder compression allowed ultra-high MW brush BCPs to self-assemble toPCs that reflected light as long as 1311 nm. Although the reported brushBCPs can assemble to IR-reflecting PCs after thermal annealing, wesought to develop a system that could assemble to such domain sizesunder ambient conditions to enable widespread applications, includingIR-reflecting paints. We envisioned that increasing the rigidity of thegrafts would enhance the overall persistence length of the brush BCP,further decreasing chain-entanglement and promoting more rapidself-assembly of ultra-high MW BCPs to even larger domains. Reportedherein is the synthesis of brush BCPs constructed from rigidisocyanate-based MMs and their rapid self-assembly through controlledevaporation to PCs that can reflect light from the UV, through thevisible, and into the near-IR (see, FIG. 1).

FIG. 1 provides: (a) Structures of isocyanate-based macromonomers andtheir ROMP to brush block copolymers. (b) Schematic representation ofthe synthesis of brush block copolymers from rigid-rod helicalmacromonomers and their self-assembly towards 1D photonic crystals. (c)Photograph of photonic crystals reflecting violet, green, and red light.

Results and Discussion Chart 1.

Structures of initiators and monomers utilized in this Example.

Synthesis of Macromonomers and Brush (Block) Copolymers.

Polyisocyanates are a class of polymers that adopt rigid helicalsecondary structures,¹⁷ and in the case of brush copolymers composed ofa polystyrene main-chain and polyhexyl isocyanate side-chains, it hasbeen shown that the rigid side-chains result in main-chain elongation,compared to similar graft copolymers with random-coil side-chains.¹⁸Thus, we found isocyanate-based MMs to be ideal candidates forinvestigating if increased side-chain rigidity would facilitateself-assembly to large domain sizes and long-wavelength reflecting PCs.Additionally, their controlled polymerization can be achieved utilizinghalf-titanocene (IV) alkoxide initiators, where the alkoxide group isquantitatively incorporated as a chain-end group on the polyisocyanate,providing an efficient means to prepare appropriately functionalizedMMs.¹⁹ Embracing this synthetic approach, an exo-norbornenehalf-titanocene derivative (2) was prepared in good yield from thereaction between CpTiCl₃ andN-(hydroxyethyl)-cis-5-norbornene-exo-2,3-dicarboximide in the presenceof Et₃N. Complex 2 was subsequently employed to produce exo-norbornenefunctionalized MMs from hexyl isocyanate (HICN, MM-1) and 4-phenyl butylisocyanate (PBICN, MM-2). These MMs exhibited similar MWs (weightaverage MW (M_(w))=6.77 and 5.99 kDa for MM-1 and MM-2, respectively)and narrow molecular weight distributions (MWDs) (polydispersity index(PDI=M_(w)/M_(n))=1.05 and 1.07 for MM-1 and MM-2, respectively). TheROMP of MM-1 and MM-2 initiated by 1 was efficient, and could be carriedout over a broad range of [MM]:[1] ratios, achieving high MM conversion,producing high MW copolymers with narrow MWDs (Table 1). Closerexamination of the ROMP of MM-1 shows that it exhibits livingcharacteristics (i.e. linear increase in MW with increasing MMconversion, and a nearly constant PDI during the course ofpolymerization), necessary for successful synthesis of well-defined BCPsin a one-pot synthetic procedure (see, FIG. 2a ).

FIG. 2 provides (a) Plot of M_(w) and PDI as a function of MM-1conversion ([MM-1]:[1]=50:1). (b) Semi-logarithmic plots ofIn([MM-1₀]/[MM-1_(t)]) as a function of time for the ROMP of MM-1 by 1.Conditions: [MM-1]=9.81 mM; [1]=19.7 μM (▪), 9.85 μM (▴), 6.57 μM (),or 3.94 μM (♦). Polymerizations performed in THF at ambient temperature

TABLE 1 Results of the ROMP of macromonomers mediated by 1.^(a) Run[MM]/ Time Conv M_(w) PDI No. MM [1] (min) (%)^(b) (kDa)^(b)(M_(w)/M_(n))^(b) 1 MM-1 50 50 98.5 364.9 1.03 2 MM-1 100 50 95.8 924.91.10 3 MM-1 150 70 95.7 1944 1.11 4 MM-1 200 90 97.0 2123 1.38 5 MM-1250 150 93.7 3310 1.39 6 MM-2 150 100 90.7 1100 1.07 ^(a)Polymerizationsperformed in 3.01 mL THF at ambient temperature. [MM-1] = [MM-2] = 9.81mM. ^(b)Determined by Light Scattering.

A similarly controlled ROMP of MM-2 was observed, although sluggish incomparison to the ROMP of MM-1. Nonetheless, ROMP of MM-2 reached highMM conversion, producing the well-defined brush copolymer (Run, 6, Table1). To enable the production of well-defined brush BCPs a thoroughcharacterization of the kinetic profile for the ROMP of the MM's isrequired. The kinetic study of the ROMP of MM-1 reveals a first-orderdependence on [MM-1] for all [MM-1]:[1] ratios investigated (see, FIG.2b ). Establishing the kinetic profile for the ROMP of MM-1 mediated by1, we proceeded to synthesize well-defined BCPs by addition of MM-2after the ROMP of MM-1. The brush BCPs could be isolated in high yields,with MWs ranging from high (1512 kDa) to ultra-high (7119 kDa), whilemaintaining impressively low PDIs (PDI=1.08-1.39), especially whentaking into consideration the magnitudes of the MWs (Table 2). All BCPshad nearly equal molar incorporation of each MM.

TABLE 2 Results of the block copolymerization of isocyanatemacromonomers mediated by 1.^(a) PDI MM-1 Run [MM-1]:[MM- Time YieldM_(w) (M_(w)/ (mol λ_(max) No. 2]:[1] (min)^(b) (%)^(c) (kDa)^(d)M_(n))^(d) %)^(e) (nm)^(f) 7 100:100:1 48 89.7 1512 1.08 52.4 334 8150:150:1 64 86.7 2918 1.15 50.8 511 9 200:200:1 85 91.5 4167 1.20 49.9664 10 215:215:1 94 85.4 5319 1.32 51.3 802 11 250:250:1 144 93.9 71191.39 52.3 1120 ^(a)Polymerizations performed in 3.01 mL THF at ambienttemperature. [MM-1] = [MM-2] = 9.81 mM. ^(b)Reaction time forpolymerization of MM-1. Polymerization was allowed to proceed for 3(runs 7-9) or 5 (runs 10 and 11) hours after the addition of MM-2.^(c)Isolated Yield. ^(d)Determined by Light Scattering. ^(e)Determinedby ¹H NMR. ^(f)Maximum peak wavelength of reflectance of the primaryreflection for films prepared from the controlled evaporation from DCM.

Self-Assembly and PC Properties of Brush BCPs.

In this Example, we report the investigation into the ability of BCPpolymers to rapidly self-assemble to PCs. Thin films of the polymerswere prepared through controlled evaporation from DCM, THF, CHCl₃, ortoluene. In contrast to the previously reported lactide/styrene brushBCPs, no significant solvent effect was observed on self-assembly, asjudged by the nearly identical reflectance spectra and λ_(max) of thefilms. The self-assembly of these brush BCPs to ordered thin-films isdictated through a delicate interplay of factors, including solvent,kinetics, polymer interactions, as well as polymer/substrateinteractions.²⁰ Our preliminary explanation for the negligible solventeffect is that the rigid architecture of the isocyanate brush BCPspromotes a highly elongated main-chain, minimizing solvent as well aspolymer interactions. This represents a degree of pre-organization,which accelerates self-assembly to ordered morphologies. As such, filmsprepared from the controlled evaporation of DCM solutions were analyzedbecause it is the most volatile solvent and most strongly highlights therapid self-assembly of the brush BCPs. The rapid self-assembly of thebrush BCPs is qualitatively observed in that the samples with MWs of1512, 2918, and 4167 kDa produced films that visually appeared violet,green, and red, respectively. Films fabricated from higher MW BCPs werewhite, suggesting that the ultra-high MW polymers were reflectingwavelengths of light beyond the visible spectrum.

FIG. 3 provides (a) Plot of reflectance as a function of wavelength forisocyanate-based brush BCP thin films with M_(w)=1512 (blue), 2918(green), 4167 (red), 5319 (purple), and 7119 (black) kDa. (b) Plot ofλ_(max) as a function of M_(w). Color scheme corresponding to M_(w) isconsistent with (a). FIG. 4 provides SEM images of cross-sections ofbrush block copolymers with M_(w)=1512 (a), 2918 (b), 4167 (c), and 5319(d) kDA. The perspective places the glass substrate parallel with thetext.

To quantitatively measure the PC crystal properties of these materials,reflectance measurements were acquired as a function of wavelength usinga spectrophotometer with an ‘integrating sphere’ diffuse reflectanceaccessory (see, FIG. 4a ). As expected, the violet, green, and redpolymer films showed primary reflectance peaks with λ_(max)=334, 511,and 664 nm, respectively. It is important to note that the magnitude ofreflectance is directly related to the number of layers in the 1D PC.Therefore, as the thickness of the film was not strictly controlled, avariation in percent reflectance was observed. In theory, optimizationof the layer thickness can lead to 100% reflectance at the appropriatewavelength. The brush BCP with the next highest MW (5319 kDa) in theseries exhibited two broad reflectance peaks at 329 and 801 nm. In thecase of the ultra-high MW BCP (M_(w)=7119 kDa), extremely broadreflectance was seen extending from 1800 nm to 300 nm, with a λ_(max) ofthe primary reflection peak estimated at the plateau with λ_(max)=1120nm. Although the broad signals in the reflection spectrum suggest poorself-assembly, the ability to produce broadly reflecting materials couldbe highly desirable in an IR-reflecting building material. Thepossibility that the domain sizes of the films could be swollen fromresidual solvent is eliminated because the film properties are unchangedafter being dried under vacuum overnight, and are stable over the courseof at least months at ambient conditions. For comparison, with thelactide/styrene brush BCPs, the highest MW polymer that was able toself-assemble through controlled evaporation to a PC structure had a MWof 2940 kDa, with λ_(max)=540 nm. Thus, the reflectance data clearlyshows that the isocyanate-based brush BCPs are superior in regards tofacile self-assembly to PCs. Specifically, under less strenuousself-assembly conditions, ultra-high MW (>7000 kDa) isocyanate-basedbrush BCPs can reflect light with λ_(max)=1120 nm, more than 580 nmlonger than the lactide/styrene system. Closer inspection of the primaryreflection peaks reveals a highly linear correlation between λ_(max) ofthis peak with increasing MW of the brush BCP (R²=0.990), which is inaccord with our earlier reported lactide/styrene brush BCP PCs (see,FIG. 4b ). As λ_(max) is directly determined by the domain sizes, thisobservation shows that within the window of our investigations, there isa linear increase in domain sizes with increasing BCP MW. In contrast,most linear BCPs exhibit a non-linear increase in domain size withincreasing MW, that scales theoretically as MW^(2/3).²¹ Thus, the rigidarchitecture and inhibited chain-entanglement of brush BPCs maintainsstructural integrity as they self-assemble into ordered morphologies,which allows larger domain sizes to be accessed with fewer number ofmonomer repeat units than their linear counterparts. This predictabilityin reflectance enables these PCs to be easily incorporated into avariety of specific applications, because the reflectance can be readilytuned through the synthetic manipulation of the polymer MW.

To assign the morphology of the brush BCPs and gain insight into theorigin of their PC properties, scanning electron microscopy (SEM) wasperformed on cross-sections of the films to directly image the polymerdomains (see, FIG. 4). For the brush BCPs with M_(w)<4167 kDa, stackedlamellar morphologies are observed, as expected for BCPs composed ofnearly equal ratios of each block (see, FIG. 4a-c ). This also explainsthe origin of the reflective properties of the brush BCPs, asalternating multilayers are the basis for 1D PCs. Most impressively,this order was simply achieved through the rapid self-assembly bycontrolled evaporation from volatile DCM. Thus, the well-orderedmorphologies still accessed by the brush BCPs with MW up to 4167 kDaexplains the ability of these polymers to reflect such long wavelengthsof light. In contrast, in the lactide/styrene system, thermal annealingwas required to self-assemble high MW polymers to equally orderedmorphologies. Additionally, with that system, a variation in layerthickness and morphological order was observed as a function of distancefrom the glass substrate. However, with the current isocyanate-basedbrush BCPs, the layer thickness and lamellae ordering was uniformthroughout the film, regardless of distance from the glass substrate,further demonstrating the drastic beneficial effects that the rigidgrafts have on the self-assembly of the brush BCPs to PCs.

When the polymer MW was increased further, unordered morphologieslacking any well-defined domains were observed in the SEM analysis (see,FIG. 4d ). This lack of order clearly explains the broad reflectancepeaks observed. More so, the unordered morphologies revealed by SEMbrings forth the question as to how the linear relationship betweenλ_(max) and BCP MW still holds true with these ultra-high MW polymers.This behavior may be attributed to the inhibited self-assembly of theseultra-high MWs.

FIG. 5 provides Plot of reflectance as a function of wavelength forisocyanate-based brush BCP thin films with M_(w)=1512 (blue), 2918(green), 4167 (red), 5319 (purple), and 7119 (black) kDa (solid), andthe corresponding simulated spectra (dashed).

To further support the proposed origin of reflectivity, the polymernanostructures were modeled using transfer matrix simulations (see, FIG.5).²² An initial approximation of the size of each block domain was madeusing the first order peak of reflection, from the equationλ_(max)=2(n₁x₁+n₂x₂), using the measured refractive indices of thecorresponding brush homopolymers by ellipsometry. A coefficient ofvariation (CV) for the layer thickness was introduced to account for theincreased bandwidth of the reflection peaks due to size dispersity anddisorder in the nanostructure. The CV for the layer thicknesses was setat 10% —this single free parameter provides a method of accounting forthe effect of lamellae size distribution on the line widths of theoptical spectra. The reflectance spectra of the highest molecular weightsamples are broad and no longer resemble the simulated spectra, asexpected from the SEM data. Our modeling supports the conclusion thatthese lamellar nanostructures represent 1D photonic crystals.

Conclusion

In conclusion, a series of well-defined (PDI=1.08-1.39) isocyanate-basedbrush block copolymers have been synthesized with high (1512 kDa) toultra-high (7119 kDa) molecular weights. Due to the rigid-rod secondarystructure of the isocyanate grafts, the self-assembly of these blockcopolymers is enhanced, such that they rapidly form well-orderedmorphologies composed of stacked lamellae with large domain sizes. Asthe domain sizes are directly controlled by the polymer molecularweights, the wavelength of reflectance can be synthetically andpredictably tuned from the UV to the near IR by manipulation of thepolymer chain length. Visualization of the polymer morphology throughSEM and optical modeling confirm that the origin of the reflectiveproperties of these novel polymers is through their assembled into 1Dphotonic crystal architectures. These IR reflecting materials can befabricated by the evaporation from a volatile solvent under ambientconditions, thus, they show promise as a new technology towardsIR-reflecting coatings that can be applied as paints.

Experimental Section

Materials and Methods.

(H₂IMes)(PPh₃)₂(Cl)₂RuCHPh was recieved as a research gift from MateriaInc. and converted to 1 via literature procedure.²³ All other chemicalswere purchased from Sigma Aldrich. Solvents were purified by passagethrough solvent purification columns and further degassed with argon.²⁴Hexyl isocyanate and 4-phenylbutyl isocyanate were dried over CaH₂overnight and vacuum distilled.N-(hydroxyethyl)-cis-5-norbornene-exo-2,3-dicarboximide was preparedaccording to literature procedure.²⁵

All reactions were carried out in flamed Schlenk-type glassware on adual-manifold Schlenk line or in a nitrogen-filled glovebox. NMR spectrawere recorded on a Varian Inova 300 MHz spectrometer. Chemical shiftswere referenced to internal solvent resonances and are reported as partsper million relative to tetramethylsilane. Polymer molecular weightswere determined utilizing THF as the eluent by multi-angle lightscattering (MALS) gel permeation chromatography (GPC) using a miniDAWNTREOS light scattering detector, a Viscostar viscometer, and anOptilabRex refractive index detector, all from Wyatt Technology. AnAgilent 1200 UV-Vis detector was also present in the detector stack.Absolute molecular weights were determined using dn/dc values calculatedby assuming 100% mass recovery of the polymer sample injected into theGPC. Polymer thin films were prepared from the controlled evaporation ofpolymer solutions (˜1.5 g/L) in dichloromethane onto glass slides thathad been previously washed with methanol and hexane. After the solventwas allowed to evaporate, the samples were dried under vacuum overnight.SEM images were taken on a ZEISS 1550 VP Field Emission SEM. Reflectionmeasurements were performed on a Cary 5000 UV/Vis/NIR spectrophotometer,equipped with an ‘integrating sphere’ diffuse reflectance accessory(Internal DRA 1800). All measurements were referenced to a LabSphereSpectralon 99% certified reflectance standard. The samples wereilluminated through a Spectralon-coated aperature with a diameter of 1cm, with a beam area of approximately 0.5 cm². The samples were scannedat a rate of 600 nm/min, with a 1 nm data interval, from 1800 to 200 nm,with a detector crossover (InGaAs to PMT) at 800 nm.

Synthesis of CpTiCl₂(C₁₁H₁₂NO₃) (2):

In a glovebox, a 25 mL flask was charged with 483 mg of CpTiCl₃ (2.20mmol), 10 mL benzene, and a stir bar. To the rapidly stirred solutionwas added dropwise a solution ofN-(hydroxyethyl)-cis-5-norbornene-exo-2,3-dicarboximide (457 mg, 2.20mmol) and triethyl amine (223 mg, 2.20 mmol) in 10 mL of benzene. Thereaction was allowed to stir for 2 h and was then filtered through aglass frit. The volatiles were removed from the filtrate affording ayellow solid. The solid was recrystallized from a toluene/pentanesolvent mixture to afford 350 mg (40.7%) of the pure product.

¹H NMR (C₆D₆, 300 MHz, 25° C.): δ 6.16 (s, 5H), 5.70 (t, J=1.86 Hz, 2H),4.28 (t, J=5.58 Hz, 2H), 3.40 (t, J=14.3 Hz, 2H), 3.05-3.03 (m, 2H),2.29 (d, J=1.00 Hz, 2H), 1.29-1.21 (m, 2H). ¹³C NMR (C₆D₆, 75 MHz, 25°C.): δ 177, 138, 120, 78.9, 48.4, 45.8, 43.6, 40.5. HRMS (FAB+):Calculated: 390.0149. Found: 390.0143.

Poly(Hexyl Isocyanate) Macromonomer (MM-1):

A 10 mL round bottom flask was charged with 460 mg of 2 (1.18 mmol), 250μL of THF, and a stir bar. To the stirred suspension was added 6.87 mLof hexyl isocyanate (47.2 mmol, 40 equiv.). The reaction was allowed toproceed for 21 h before being poured into 50 mL of methanol. The polymerwas isolated by filtration, redissolved in methylene chloride, andprecipitated again into 50 mL of methanol. MM-1 was isolated byfiltration and dried under vacuum at ambient temperature to a constantweight (5.53 g, 92.2%).

¹H NMR (CDCl₃, 300 MHz, 25° C.): δ 6.30 (bs), 4.28 (bs), 3.68 (bs), 3.08(bs), 2.71 (bs), 1.62 (bs), 1.28 (bs), 1.12-1.01 (m). M_(w)=6.77 kDa;PDI=1.05. dn/dc=0.0829 mL/g.

Poly(4-Phenyl Butyl Isocyanate) Macromonomer (MM-2):

A 10 mL round bottom flask was charged with 445 mg of 2 (1.14 mmol), 250μL of THF, and a stir bar. To the stirred suspension was added 1.94 mLof 4-phenyl butyl isocyanate (11.3 mmol, 10 equiv.). The reaction wasallowed to proceed for 21 h before being poured into 50 mL of methanol.The polymer was isolated by filtration, redissolved in methylenechloride, and precipitated again into 50 mL of methanol. The polymer wasisolated by filtration and dried under vacuum at ambient temperature toa constant weight (1.69 g, 84.4%).

¹H NMR (CDCl₃, 300 MHz, 25° C.): δ 7.31-7.14 (m), 6.29 (bs), 4.20 (bs),3.72 (bs), 3.25 (bs), 2.59 (bs), 1.63 (bs), 1.29-1.19 (m). M_(w)=5.99kDa; PDI=1.07. dn/dc=0.140 mL/g.

Synthesis of Homo-Brush Polymers:

A 20 mL vial was charged with a stir bar, 200 mg of MM-1 (29.5 μmol) or177 mg MM-2 (29.5 μmol), and 3.0 mL of THF. With rapid stirring 10 μL ofan appropriate concentration of 1 in THF was quickly added via syringe.For kinetic analysis a 0.2 mL aliquot of the reaction solution was takenat pre-determined time intervals and injected into a 2.0 mL septumsealed vial containing a solution of 25 μL of ethyl vinyl ether in 0.7mL of THF. The aliquot was analyzed by GPC to determine the percentmacromonomer conversion by comparing the peaks corresponding to thebrush polymer and the unreacted macromonomer. The polymerization wasquenched by the addition of 200 μL of ethyl vinyl ether and addition of25 mL of methanol. The mixture was allowed to stir for 1 hour, and thepolymer was isolated by filtration and dried under vacuum at ambienttemperature to a constant weight.

Homo-Brush Polymer from MM-1: ¹H NMR (CDCl₃, 300 MHz, 25° C.): δ 5.78(bs), 3.94-3.3 (m), 3.68 (bs), 3.22 (bs), 1.85-1.45 (m), 1.28 (bs),1.11-1.01 (bs), 0.87 (bs). dn/dc=0.0800 mL/g.

Homo-Brush Polymer from MM-2: ¹H NMR (CDCl₃, 300 MHz, 25° C.): δ7.35-6.96 (m), 5.67 (bs), 3.91 (bs), 3.67 (bs), 3.25 (bs), 2.57 (bs),1.52 (bs), 1.27 (bs). dn/dc=0.143 mL/g.

Synthesis of Brush Block Copolymers:

A 20 mL vial was charged with a stir bar, 200 mg of MM-1 (29.5 μmol),and 3.0 mL of THF. With rapid stirring 10 μL of an appropriateconcentration of 1 in THF was quickly added via syringe. Atpredetermined time intervals 177 mg of MM-2 (29.5 μmol) was added as asolid and the solution was allowed to react as specified in thepolymerization tables. The polymerization was quenched by the additionof 200 μL of ethyl vinyl ether and addition of 25 mL of methanol. Themixture was allowed to stir for 1 hour, and the polymer was isolated byfiltration and dried under vacuum at ambient temperature to a constantweight. No unreacted macromonomer was present in the isolated brushblock copolymer, as determined by GPC analysis.

¹H NMR (CDCl₃, 300 MHz, 25° C.): δ 7.35-6.96 (m), 5.67 (bs), 4.18-3.33(m), 3.23 (bs), 2.54 (bs), 1.94-1.42 (m), 1.28 (bs), 1.13-0.99 (m), 0.87(bs). dn/dc values for runs 7-11 in Table 2=0.128, 0.108, 0.124, 0.110,and 0.0909 mL/g, respectively.

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Example 2 Precisely Tunable Photonic Crystals from RapidlySelf-Assembling Brush Block Copolymer Blends

Block copolymers (BCPs) are ideal large area photonic band gap materialsbecause of their low cost potential in terms of both raw material and“bottom-up” fabrication via self-assembly.^([1]) The microphasesegregation of chemically distinct polymer blocks^([2]) to materialspossessing a periodic dielectric function can form a photonic band gapthat forbids the propagation of certain wavelengths of light through thebulk. Such materials are termed photonic crystals (PCs) and have manyapplications as optical filters, mirrors, and cavities.^([3]) In thesimplest scenario, 1-D PCs are constructed from alternating layers ofmaterials, where the reflected wavelength is determined by the thicknessand refractive index of each layer. Unfortunately, chain-entanglement, adefinitive polymer characteristic, most often restricts the ability ofultra-high molecular weight (MW) BCPs to self-assemble to ordereddomains large enough to reflect long wavelengths of light. Thus, BCPbased PCs usually only reflect wavelengths of light as long asgreen,^([4]) while longer wavelengths are only accessible with domainswelling with added components (i.e. solvent^([5]) orhomo-polymers^([6])), typically requiring complex annealing procedures,which greatly reduces their potential applications.

High MW brush BCPs are able to rapidly self-assemble, due to theirreduced chain-entanglement, to PCs that can reflect all wavelengths oflight from the UV to the near infrared without relying on any additionalswelling components.^([7]) Utilizing ruthenium mediated ring-openingmetathesis polymerization (ROMP)^([8]) we have developed a“grafting-through” polymerization of macromonomers (MMs) to ultra-highMW brush polymers.^([9]) The “grafting-through” polymerization of MMsaffords highly uniform brush BCP's, where the sterically demanding arrayof low MW side-chains greatly reduces chain-entanglement, enforcing theunifying main-chain to assume a highly elongated conformation.^([10]) Assuch, symmetric brush BCP's readily self-assemble without complicatedannealing methods to stacked lamellae composed of alternating layers ofthe different blocks, providing a facile means to 1-D PC architectures(Scheme 1).^([7]) The domain sizes directly scale with the MW of the BCPenabling the wavelength of reflected light to be predictably modulatedby synthetically controlling the polymer MW.^([7]) Although thisapproach successfully produces PCs that reflect target wavelengths oflight, it requires that a specific MW brush BCP must be synthesized toreflect each wavelength of light; a more flexible and desirabletechnology would be post-synthetically tunable, bypassing suchapplication-specific synthetic requirements.

In the case of linear random coil, symmetric BCPs it has beendemonstrated that polymer blends of two different MW BCPs canself-assemble to uniform stacked lamellar morphologies, if the ratio ofthe polymer MWs is less than five.^([11]) The resulting size is anaverage of the relative ratio of the two components and is permitted bythe conforming and flexible characteristics of random coil linear BCPsas they access morphologies that minimize enthalpy interactionparameters through a proposed mechanism involving stretching of the lowMW BCP and a compression of the high MW BCP. Additionally, similarblends of linear BCPs, in the presence of a swelling solvent and shearalignment, can exhibit temporary photonic crystal characteristics,reflecting light across the visible spectrum, which are lost uponsolvent evaporation.^([5a]) In this Example, we report a study of blendsof brush BCPs of different MW and the ability of these materials toassume similar conforming morphologies, despite their inherently rigidarchitectures, as a means to readily modulate the domain sizes, and thusthe bandgaps of the PCs. Using this technique, it was found that thewavelength of reflected light is precisely tunable across the visiblespectrum of light and into the near infrared (NIR), simply throughcontrolling the relative incorporation of the two polymers, greatlyenhancing the practicality of brush BCP PCs.

FIG. 6 provides structures and molecular weight properties ofmacromonomers and brush block copolymers utilized in this Example 2.

The two different MW brush BCPs employed in this study were constructedthrough sequential ROMP of equal amounts of exo-norbornenefunctionalized hexyl isocyanate (MM-1) and 4-phenyl butyl isocyanate(MM-2) MMs (see, FIG. 6).^([7b]) A film of the lower MW brush BCP(BCP-1: weight average MW [M_(w)]=1512×10³ g/mol, molecular weightdistribution [MWD]=1.08) prepared by the controlled evaporation from DCMexhibited a maximum peak reflectivity (λ_(max)) of 360 nm, while thefilm prepared in identical fashion of the higher MW brush BCP (BCP-2:M_(w)=4167×10³ g/mol, MWD=1.20) exhibited λ_(max)=785 nm. A filmprepared from the controlled evaporation of a DCM solution of a 50:50weight percent blend of BCP-1 and BCP-2 exhibited a single reflectionpeak with λ_(max)=541 nm. By varying the weight percent of the two brushBCP's from 100% BCP-1 to 100% BCP-2, at 10% intervals, a total of 11different films were prepared. Each PC film showed a primary reflectionpeak where λ_(max) was systematically tuned to increasing wavelengths oflight with increasing incorporation of BCP-2. Most impressively, ahighly linear trend (R²=0.989) in increasing λ_(max) as a function ofincreasing weight percent BCP-2 was established, allowing for theproduction of PCs that reflect all wavelengths of light across thevisible spectrum and into the near IR (see, FIG. 7).

FIG. 7 provides photograph of brush block copolymer blends reflectinglight across the visible spectrum (top). Plots of reflectance vs.wavelength (bottom-left) and maximum peak wavelength of reflectance vs.weight fraction of blend (% BCP-2, bottom-right) of the different blockcopolymer blends.

These results strongly suggest that despite the rigid architecture ofthe brush BCPs, the blends of the two different MW polymers are able toconform to uniform domains where the size is dictated by the relativeratio of the two components. We have previously established that thebrush BCP's rapidly self-assemble to stacked lamellae. However, themechanism of the blends to form such uniform domains remained unclear.The two most obvious routes would include the conforming assembly of theblends to stacked lamellae where the domains scale as an average of thetwo BCPs, similar to the mechanism followed by linear BCPs or through agradual change in polymer morphology to compensate for the varyingratios of the two BCPs. To gain insight into the blending mechanism,scanning electron microscopy (SEM) was utilized to visually image themorphologies of the films.

FIG. 8 provides SEM images of cross-sections of block copolymer blendswith 0% (top-right), 30% (top-right), 80% (bottom-left), and 100%(bottom-right) of BCP-2. Perspective places the glass substrate parallelwith the text.

For all BCP blends, highly ordered stacked lamellae were observed in theSEM analysis (see, FIG. 8). These data strongly support the proposalthat the different MW BCPs are able to adopt structures similar to theirlinear analogues,^([11]) necessitating an elongation of BCP-1 and astructural distortion of BCP-2. Although it is highly unlikely that thebrush BCPs are able to partake in extreme chain-folding because of theirinherently rigid structures, bending of BCP-2 to conform to the lowestenthalpy state must be occurring to some extent to explain for theresulting highly uniform domains of the blends.

Blending of two different molecular weight brush block copolymersaffords an effective means to simply control the domain sizes, and thusphotonic properties of these materials. This blending strategy can beapplied to any type of system with a brush copolymer that can besynthesized from any means with varying amounts of grafting density. Itcould also include the incorporation of other materials, including butnot limited to, other homo-polymers, or any type of copolymer (di, tri,statistical, etc.) that are constructed from organic or inorganicmaterials. The brush copolymer does not need to be a di-block copolymer,but can also include statistical copolymers, or tri-block, or any numberof blocks. Additionally, the ratio in MWs can be varied to accessdifferent morphologies. It can also apply to non-symmetric brush blockcopolymers, including asymmetry in molecular weight of the macromonomer,grafting density, or the relative incorporation of the macromonomers.The number of blending components can exceed 2, and be any combinationof the above mentioned components. The materials can also be swelledwith solvents or small molecules and may or may not be cross-linked withcovalent or non-covalent interactions. Furthermore, blending of twodifferent molecular weight brush block copolymers provided analternative means to readily modulate the domain sizes and photonicproperties of these materials.

We have shown that blends between different MW brush BCPs form highlyuniform, stacked lamellar morphologies. The resulting domains of the 1-DPC architectures scale linearly with the weight percent incorporation ofthe two polymers. Thus, a wide range of readily tunable photonic bandgap materials can be easily fabricated simply through blending of twopolymers. Because the brush BCP's rigid architecture greatly minimizeschain-entanglement, these blends rapidly self-assemble throughcontrolled solvent evaporation of a volatile solvent, however, thereappears to be sufficient flexibility to conform to precise layeredstructures. We foresee that this simple, “bottom-up”, readily tunableapproach provides an attractive means to precisely tunable photonic bandgap materials through the rapid self-assembly of brush BCP blends.

Experimental Section

The synthesis and characterization of the macromonomers and brush blockcopolymers has been described previously.^([7b]) Blends were prepared bymixing stock solutions (c=1.5 g/L; DCM) of BCP-1 and BCP-2 (10 mL totalvolume) in a 20 mL vial. A glass slide that had been previously washedwith methanol and hexanes was placed vertically into the vial as thesolvent was allowed to evaporate. Reflection measurements were performedon a Cary 5000 UV/Vis/NIR spectrophotometer, equipped with an‘integrating sphere’ diffuse reflectance accessory (Internal DRA 1800).All measurements were referenced to a LabSphere Spectralon 99% certifiedreflectance standard. The samples were illuminated through aSpectralon-coated aperature with a diameter of 1 cm, with a beam area ofapproximately 0.5 cm². The samples were scanned at a rate of 600 nm/min,with a 1 nm data interval, from 1800 to 200 nm, with a detectorcrossover (InGaAs to PMT) at 875 nm. SEM images of freeze-fracturedsamples that were stained with RuO₄ and carbon coated were taken on aZEISS 1550 VP Field Emission SEM.

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Example 3 Blending of Different Molecular Weight Polymers

We report fabrication of photonic crystals by brush block-copolymer(BCPs) blending. By incrementally changing the ratio between twocomponents in the blend we were able to access photonic crystals thatreflected across the spectrum, anywhere from UV into near IR. A similarstrategy was pursued using on dendronized block-copolymers, wheremacromolecular pendant chain was replaced with Newkome-type dendriticgroup, functionalized with either benzyl ether group or long aliphaticchain.

FIG. 9 provides structure of wedge-type block copolymers and FIG. 12provides structures of brush block copolymer, linear polystyrene, andpolynorbornene-graft-polystyrene.

According to the earlier reported data on certain linear symmetricalBCPs a blend will maintain stacked lamellae morphology as long as theratio between molecular weight of two components is less than 5. Thusfor our study we chose two dendronized BCPs samples with M_(w): 480 kDa(PDI=1.05) reflecting in UV (λ_(max)=330 nm) and 1250 kDa (PDI=1.10)reflecting red (λ_(max)=768 nm). Films were prepared by controlledevaporation from dichloromethane solution in weight percent ratios of25:75, 50:50 and 75:25. All films exhibited a primary reflection peakwith λ_(max) increasing linearly with increasing incorporation of highermolecular weight component (see, FIG. 10) and Table 3.

FIG. 10 provides plots of reflectance as a function of wavelength of thedendronized BCP blends. The insert represents linear correlation betweenweight fraction and wavelength of reflectance.

TABLE 3 Summary of reflectance data Weight fraction λ_(max) (%) (nm) 0330 25 490 50 586 75 755 100 768

To get understanding of the blending mechanism scanning electronmicroscopy (SEM) was employed. Stacked lamellar morphology was observedfor 75:25 and 50:50 blends while morphology of 75:25 appeared to beamorphous (see, FIG. 11).

FIG. 11 provides SEM images of cross-sections of dendronized BCPs with25% and 50% of polymer with M_(w)=1250 kDa.

FIG. 13 provides: A. Scanning electron micrograph of a thin film of abrush block copolymer constructed from polyhexyl isocyanate andpolystyrene macromonomers showing stacked lamellar morphology. B.Absorbance spectrum showing the film reflects around 400 nm light.

The brush block copolymer was constructed through the sequentialruthenium mediated ring-opening metathesis polymerization of apolyhexylisocyanate and polystyrene macromonomer. This polymer had amolecular weight (weight average molecular weight [M_(w)=1547 kDa]) anda polydispersity index (PDI) of 1.58. A thin film of this polymer wasfabricated through controlled evaporation to yield a uniformnanostructured dielectric mirror that reflected light around 400 nm(see, FIG. 13). In these experiments, UV-vis analysis was utilized toestimate the light reflecting properties of the photonic crystals. Asthe materials in solution to not exhibit an absorbance in the visiblespectrum, the “absorbance” peak in these plots correlates to thereflectance properties that arise due to periodic nanostructures of thesolid state thin films and their photonic crystal properties.

FIG. 14 provides Scanning electron micrograph of a thin film of blendsof a brush block copolymer constructed from polyhexyl isocyanate andpolystyrene macromonomers and linear polystyrene at 100 (A), 35 (B), and15 (C) % brush block copolymer demonstrating the morphology evolution.Absorbance spectrum showing the light reflecting properties of the filmscan be altered introducing greater percentage of linear polystyrene.

FIG. 15 provides: A. Scanning electron micrograph of a thin film ofblends of a brush block copolymer constructed from polyhexyl isocyanateand polystyrene macromonomers and polynorbornene-graft-polystyrene at 35(A), 27 (B), and 15 (C) % brush block copolymer demonstrating themorphology evolution. Absorbance spectrum showing the light reflectingproperties of the films can be altered introducing greater percentage ofpolynorbornene-graft-polystyrene.

This brush block copolymer was mixed with a linear polystyrene polymer(Mw=13.6 kDa; PDI=1.03). Blends were composed of weight fractions of63:35, 73:27, and 85:15% of linear polystyrene to brush block copolymer.Altering the weight incorporation of the two components can alter thelight reflecting properties and alter the nanostructured morphology(see, FIG. 14).

This brush block copolymer was blended with apolynorbornene-graft-polystyrene (M_(w)=1716 kDa; PDI=1.65) [FIG. 15].

STATEMENTS REGARDING INCORPORATION BY REFERENCE AND VARIATIONS

All references cited throughout this application, for example patentdocuments including issued or granted patents or equivalents; patentapplication publications; and non-patent literature documents or othersource material; are hereby incorporated by reference herein in theirentireties, as though individually incorporated by reference, to theextent each reference is at least partially not inconsistent with thedisclosure in this application (for example, a reference that ispartially inconsistent is incorporated by reference except for thepartially inconsistent portion of the reference).

The terms and expressions which have been employed herein are used asterms of description and not of limitation, and there is no intention inthe use of such terms and expressions of excluding any equivalents ofthe features shown and described or portions thereof, but it isrecognized that various modifications are possible within the scope ofthe invention claimed. Thus, it should be understood that although thepresent invention has been specifically disclosed by preferredembodiments, exemplary embodiments and optional features, modificationand variation of the concepts herein disclosed may be resorted to bythose skilled in the art, and that such modifications and variations areconsidered to be within the scope of this invention as defined by theappended claims. The specific embodiments provided herein are examplesof useful embodiments of the present invention and it will be apparentto one skilled in the art that the present invention may be carried outusing a large number of variations of the devices, device components,methods steps set forth in the present description. As will be obviousto one of skill in the art, methods and devices useful for the presentmethods can include a large number of optional composition andprocessing elements and steps.

When a group of substituents is disclosed herein, it is understood thatall individual members of that group and all subgroups are disclosedseparately. When a Markush group or other grouping is used herein, allindividual members of the group and all combinations and subcombinationspossible of the group are intended to be individually included in thedisclosure. Additionally, unless otherwise specified, all isotopicvariants of compounds disclosed herein are intended to be encompassed bythe disclosure. For example, it will be understood that any one or morehydrogens in a molecule disclosed can be replaced with deuterium ortritium. Isotopic variants of a molecule are generally useful asstandards in assays for the molecule and in chemical and biologicalresearch related to the molecule or its use. Methods for making suchisotopic variants are known in the art. Specific names of compounds areintended to be exemplary, as it is known that one of ordinary skill inthe art can name the same compounds differently.

It must be noted that as used herein and in the appended claims, thesingular forms “a”, “an”, and “the” include plural reference unless thecontext clearly dictates otherwise. Thus, for example, reference to “acell” includes a plurality of such cells and equivalents thereof knownto those skilled in the art, and so forth. As well, the terms “a” (or“an”), “one or more” and “at least one” can be used interchangeablyherein. It is also to be noted that the terms “comprising”, “including”,and “having” can be used interchangeably. The expression “of any ofclaims XX-YY” (wherein XX and YY refer to claim numbers) is intended toprovide a multiple dependent claim in the alternative form, and in someembodiments is interchangeable with the expression “as in any one ofclaims XX-YY.”

Unless defined otherwise, all technical and scientific terms used hereinhave the same meanings as commonly understood by one of ordinary skillin the art to which this invention belongs. Although any methods andmaterials similar or equivalent to those described herein can be used inthe practice or testing of the present invention, the preferred methodsand materials are now described. Nothing herein is to be construed as anadmission that the invention is not entitled to antedate such disclosureby virtue of prior invention.

Whenever a range is given in the specification, for example, atemperature range, a time range, or a composition or concentrationrange, all intermediate ranges and subranges, as well as all individualvalues included in the ranges given are intended to be included in thedisclosure. As used herein, ranges specifically include the valuesprovided as endpoint values of the range. For example, a range of 1 to100 specifically includes the end point values of 1 and 100. It will beunderstood that any subranges or individual values in a range orsubrange that are included in the description herein can be excludedfrom the claims herein.

As used herein, “comprising” is synonymous with “including,”“containing,” or “characterized by,” and is inclusive or open-ended anddoes not exclude additional, unrecited elements or method steps. As usedherein, “consisting of” excludes any element, step, or ingredient notspecified in the claim element. As used herein, “consisting essentiallyof” does not exclude materials or steps that do not materially affectthe basic and novel characteristics of the claim. In each instanceherein any of the terms “comprising”, “consisting essentially of” and“consisting of” may be replaced with either of the other two terms.

One of ordinary skill in the art will appreciate that startingmaterials, biological materials, reagents, synthetic methods,purification methods, analytical methods, assay methods, and biologicalmethods other than those specifically exemplified can be employed in thepractice of the invention without resort to undue experimentation. Allart-known functional equivalents, of any such materials and methods areintended to be included in this invention. The terms and expressionswhich have been employed are used as terms of description and not oflimitation, and there is no intention that in the use of such terms andexpressions of excluding any equivalents of the features shown anddescribed or portions thereof, but it is recognized that variousmodifications are possible within the scope of the invention claimed.Thus, it should be understood that although the present invention hasbeen specifically disclosed by preferred embodiments and optionalfeatures, modification and variation of the concepts herein disclosedmay be resorted to by those skilled in the art, and that suchmodifications and variations are considered to be within the scope ofthis invention as defined by the appended claims.

1-78. (canceled)
 79. A structure comprising a supramolecular assembly ofa polymer blend of at least one block copolymer and at least a secondcomponent; wherein said polymer blend comprises: a first block copolymercomprising: a first polymer block comprising at least 10 first repeatingunits; wherein each of said first repeating units of said first polymerblock comprises a first polymer backbone group directly or indirectlycovalently linked to a first polymer side chain group or a first wedgegroup; and a second polymer block comprising at least 10 secondrepeating units; wherein each of said second repeating units of saidsecond polymer block comprises a second polymer backbone group directlyor indirectly covalently linked to a second polymer side chain group orsecond wedge group that is different than said first polymer side chaingroup and said first wedge group; wherein said first and secondrepeating units are directly or indirectly covalently linked along abackbone of said block copolymer; and the second component having acomposition that is different from said first block copolymer.
 80. Thestructure of claim 79, wherein said second component comprises ahomopolymer, a copolymer, an oligomer, a solvent, a metal, a smallmolecule or particle.
 81. The structure of claim 79, wherein saidstructure is formed via molecular self-assembly of said first blockpolymers and said second component of said polymer blend to generatesaid supramolecular assembly.
 82. The structure of claim 79, whereinsaid structure is formed via thermal annealing, solvent annealing, spincoating, shear alignment, painting, tape casting, co-extrusion, dropcasting, spray coating or by the application of an external pressure tosaid polymer blend.
 83. (canceled)
 84. The structure of claim 79comprising a periodic structure or a photonic band gap material. 85.(canceled)
 86. The structure of claim 79, wherein said structureabsorbs, scatters or reflects electromagnetic radiation havingwavelengths greater than or equal to 400 nm. 87-89. (canceled)
 90. Thestructure of claim 79, wherein said structure is characterized by aperiodically varying refractive index.
 91. The structure of claim 79,wherein a size (S) of the structure increases substantially linearlywith molecular weight (MW) of said first block copolymer pursuant to theexpression (E4) wherein 0.85<x<1:S∝MW^(x)  (E4). 92-101. (canceled)
 102. The structure of claim 79,wherein said second component is a second block copolymer comprising atleast one polymer block different from said first polymer block and saidsecond polymer block of said first block copolymer.
 103. (canceled) 104.The structure of claim 102, wherein the ratio of the molecular weight ofthe first block copolymer to the molecular weight of the second blockcopolymer is selected over the range of 0.2 to
 5. 105-106. (canceled)107. The structure of claim 79, wherein said first block copolymer is abrush block copolymer or a wedge-type block copolymer. 108-122.(canceled)
 123. The structure of claim 79, wherein said first blockcopolymer has the formula (FX5a) or (FX5b1):

wherein J is a repeating group of said first polymer side chain group, Kis a repeating group of said second polymer side chain group, G² is saidsecond wedge group; each of R¹⁰ and R¹¹ is independently a polymer sidechain terminating group; and each of p and q is independently an integerselected from the range of 30 to
 2000. 124. The structure of claim 123,wherein each of J and K is independently an unsubstituted or substitutedisocyanate group, methacrylate group, acrylate group, acrylamide group,methacrylamide group, quinoxaline group, guanidine group, silane group,acetylene group, amino acid group, chloral group, lactide group, styrenegroup, acrylate group, tert-butyl, siloxane group, dimethylsiloxanegroup, n-butyl acrylate group, ethylene glycol group, ethylene oxidegroup, ethylene group, propylene group, tetrafluoroethylene group, orvinyl chloride group.
 125. The structure of claim 123, wherein each ofR¹⁰ and R¹¹ is independently hydrogen, C₁-C₁₀ alkyl, C₃-C₁₀ cycloalkyl,C₅-C₁₀ aryl, C₅-C₁₀ heteroaryl, C₁-C₁₀ acyl, C₁-C₁₀ hydroxyl, C₁-C₁₀alkoxy, C₂-C₁₀ alkenyl, C₂-C₁₀ alkynyl, C₅-C₁₀ alkylaryl, —CO₂R³⁰,—CONR³¹R³², —COR³³, —SOR³⁴, —OSR³⁵, —SO₂R³⁶, —OR³⁷, —SR³⁸, —NR³⁹R⁴⁰,—NR⁴¹COR⁴², C₁-C₁₀ alkyl halide, phosphonate, phosphonic acid, silane,siloxane acrylate, or catechol; wherein each of R³⁰-R⁴² is independentlyhydrogen or C₁-C₅ alkyl. 126-127. (canceled)
 128. The structure of claim123, wherein said first block copolymer has the formula (FX6A) or(FX6B1):

wherein R¹ is independently a hydrogen, C₁-C₃₀ alkyl, C₃-C₃₀ cycloalkyl,C₅-C₃₀ aryl, C₅-C₃₀ heteroaryl, C₁-C₃₀ acyl, C₁-C₃₀ hydroxyl, C₁-C₃₀alkoxy, C₂-C₃₀ alkenyl, C₂-C₃₀ alkynyl, C₅-C₃₀ alkylaryl, —CO₂R³⁰,—CONR³¹R³², —COR³³, —SOR³⁴, —OSR³⁵, —SO₂R³⁶, —OR³⁷, —SR³⁸, —NR³⁹R⁴⁰,—NR⁴¹COR⁴², C₁-C₃₀ alkyl halide, phosphonate, phosphonic acid, silane,siloxane, silsesquioxane, C₂-C₃₀ halocarbon chain, C₂-C₃₀perfluorocarbon, C₂-C₃₀ polyethylene glycol, a metal, or a metalcomplex, wherein each of R³⁰-R⁴² is independently H, C₅-C₁₀ aryl orC₁-C₁₀ alkyl.
 129. The structure of claim 128, wherein said first blockcopolymer has the formula (FX7):

wherein R¹² is independently a hydrogen, C₁-C₃₀ alkyl, C₃-C₃₀cycloalkyl, C₅-C₃₀ aryl, C₅-C₃₀ heteroaryl, C₁-C₃₀ acyl, C₁-C₃₀hydroxyl, C₁-C₃₀ alkoxy, C₂-C₃₀ alkenyl, C₂-C₃₀ alkynyl, C₅-C₃₀alkylaryl, —CO₂R³⁰, —CONR³¹R³², —COR³³, —SOR³⁴, —OSR³⁵, —SO₂R³⁶, —OR³⁷,—SR³⁸, —NR³⁹R⁴⁰, —NR⁴¹COR⁴², C₁-C₃₀ alkyl halide, phosphonate,phosphonic acid, silane, siloxane, silsesquioxane, C₂-C₃₀ halocarbonchain, C₂-C₃₀ perfluorocarbon, C₂-C₃₀ polyethylene glycol, a metal, or ametal complex, wherein each of R³⁰-R⁴² is independently H, C₅-C₁₀ arylor C₁-C₁₀ alkyl; and wherein R¹ and R¹² are different groups.
 130. Theblock copolymer of claim 129, wherein R¹ is a C₁-C₃₀ alkyl and R¹² is aC₅-C₃₀ aryl.
 131. The block copolymer of claim 129, having the formula(FX8a) or (FX8b):

wherein each of r, s, t and v are independently an integer selected fromthe range of 1 to
 10. 132. The structure of claim 79 wherein said secondpolymer block comprises said second wedge groups. 133-134. (canceled)135. The structure of claim 132, wherein each of said second wedgegroups is characterized by at least two branch points each terminatingin an independent terminating branch moiety comprising at least 4 atoms.136. The structure of claim 132, wherein each of the second wedge groupsis characterized by at least three branching points each terminating inan independent terminating branch moiety comprising at least 10 atoms.137. (canceled)
 138. The structure of claim 132, wherein each of saidsecond wedge groups independently comprises a C₂-C₃₀ alkyl, C₃-C₃₀cycloalkyl, C₅-C₃₀ aryl, C₅-C₃₀ heteroaryl, C₂-C₃₀ ester, C₂-C₃₀ ether,C₂-C₃₀ thioether, C₂-C₃₀ amine, C₂-C₃₀ imide, C₂-C₃₀ halocarbon chain,C₂-C₃₀ perfluorocarbon or C₂-C₃₀ polyethylene glycol.
 139. (canceled)140. The structure of claim 132, wherein each of said second wedgegroups independently comprises a group derived from a substituted orunsubstituted adamantane, silsesquioxane, norbornane, terpenoid,polyethylene glycol, or borneol.
 141. The structure of claim 79, whereinsaid first block copolymer has the formula (FX10a), (FX10b), (FX10c),(FX10d), (FX10e), (FX10f), (FX10g) or (FX10h):

wherein: J is a repeating group of said first polymer side chain group;G¹ is said first wedge group; G² is said second wedge group; G³ is athird wedge group and G⁴ is said third wedge group; R¹⁰ is independentlya polymer side chain terminating group; and p is independently aninteger selected from the range of 35 to
 2000. 142. The structure ofclaim 141, wherein each of G¹, G², G³ or G⁴ independently has theformula (W1), (W2) or (W3):

wherein each of W¹-W⁵ is independently a linking group; and each ofY¹-Y⁵ is independently a hydrogen, C₁-C₃₀ alkyl, C₃-C₃₀ cycloalkyl,C₅-C₃₀ aryl, C₅-C₃₀ heteroaryl, C₁-C₃₀ acyl, C₁-C₃₀ hydroxyl, C₁-C₃₀alkoxy, C₂-C₃₀ alkenyl, C₂-C₃₀ alkynyl, C₅-C₃₀ alkylaryl, —CO₂R³⁰,—CONR³¹R³², —COR³³, —SOR³⁴, —OSR³⁵, —SO₂R³⁶, —OR³⁷, —SR³⁸, —NR³⁹R⁴⁰,—NR⁴¹COR⁴², C₁-C₃₀ alkyl halide, phosphonate, phosphonic acid, silane,siloxane, silsesquioxane, C₂-C₃₀ halocarbon chain, C₂-C₃₀perfluorocarbon, or C₂-C₃₀ polyethylene glycol; wherein each of R³⁰-R⁴²is independently hydrogen, C₅-C₁₀ aryl or C₁-C₁₀ alkyl.
 143. Thestructure of claim 141, wherein each of G¹, G², G³ or G⁴ independentlyhas the formula has the formula (W4), (W5), (W6), (W6), (W8), (W9) or(W10):

wherein Bn is a benzyl group. 144-145. (canceled)
 146. The structure ofclaim 128, wherein each of L¹ and L^(2′) is independently a single bond,—(CH₂)_(q)—, —(CH₂)_(q)O(CH₂)_(r)—, —(CH₂)_(q)S(CH₂)_(r)—,—(CH₂)_(q)O₂(CH₂)_(r)—, —(CH₂)_(q)SO(CH₂)_(r), —(CH₂)_(q) SO₂(CH₂)_(r)—,—(CH₂)_(q)SO₃(CH₂)_(r)—, —(CH₂)_(q)OSO₂(CH₂)_(r)—,—(CH₂)_(q)NR¹⁹(CH₂)_(r)—, —(CH₂)_(q)CO(CH₂)_(r)—,—(CH₂)_(q)COO(CH₂)_(r)—, —(CH₂)_(q)OCO(CH₂)_(r)—,—(CH₂)_(q)OCOO(CH₂)_(r)—, —(CH₂)_(q)CONR²⁰(CH₂)_(r)—,—(CH₂)_(q)NR²¹CO(OH₂)_(r)—, —(CH₂)_(q)OCONR²²(CH₂)_(r)—,—(CH₂)_(q)NR²³COO(CH₂)_(r)—, or —(CH₂)_(q)NR²⁴CONR²⁵(CH₂)_(r)—; whereineach of R¹⁹-R²⁵ is independently hydrogen or C₁-C₅ alkyl; and whereineach of q and r is independently an integer selected from the range of 0to
 10. 147. (canceled)
 148. The structure of claim 128, wherein each ofQ¹ and Q² is independently hydrogen, C₁-C₁₀ alkyl, C₃-C₁₀ cycloalkyl,C₅-C₁₀ aryl, C₅-C₁₀ heteroaryl, C₁-C₁₀ acyl, C₁-C₁₀ hydroxyl, C₁-C₁₀alkoxy, C₂-C₁₀ alkenyl, C₂-C₁₀ alkynyl, C₅-C₁₀ alkylaryl, —CO₂R³⁰,—CONR³¹R³², —COR³³, —SOR³⁴, —OSR³⁵, —SO₂R³⁶, —OR³⁷, —SR³⁸, —NR³⁹R⁴⁰,—NR⁴¹COR⁴², C₁-C₁₀ alkyl halide, phosphonate, phosphonic acid, silane,siloxane, acrylate, or catechol; wherein each of R³⁰-R⁴² isindependently hydrogen, C₁-C₁₀ alkyl or C₅-C₁₀ aryl.
 149. The blockcopolymer of claim 128, wherein each of R¹⁰ and R¹¹ is independently ahydrogen, C₁-C₁₀ alkyl, C₃-C₁₀ cycloalkyl, C₅-C₁₀ aryl, C₅-C₁₀heteroaryl, C₁-C₁₀ acyl, C₁-C₁₀ hydroxyl, C₁-C₁₀ alkoxy, C₂-C₁₀ alkenyl,C₂-C₁₀ alkynyl, C₅-C₁₀ alkylaryl, —CO₂R³⁰, —CONR³¹R³², —COR³³, —SOR³⁴,—OSR³⁵, —SO₂R³⁶, —OR³⁷, —SR³⁸, —NR³⁹R⁴⁰, —NR⁴¹COR⁴², C₁-C₁₀ alkylhalide, phosphonate, phosphonic acid, silane, siloxane, acrylate orcatechol; wherein each of R³⁰-R⁴² is independently hydrogen or C₁-C₅alkyl.
 150. (canceled)
 151. A method of modulating incidentelectromagnetic radiation; said method comprising: providing a structurecomprising a supramolecular assembly of a polymer blend of at least oneblock copolymer and at least a second component; wherein said polymerblend comprises: (i) a first block copolymer comprising: a first polymerblock comprising at least 10 first repeating units; wherein each of saidfirst repeating units of said first polymer block comprises a firstpolymer backbone group covalently linked to a first polymer side chaingroup or a first wedge group; and a second polymer block comprising atleast 10 second repeating units; wherein each of said second repeatingunits of said second polymer block comprises a second polymer backbonegroup covalently linked to a second polymer side chain group or secondwedge group that is different than said first polymer side chain groupand said first wedge group; wherein said first and second repeatingunits are directly or indirectly covalently linked along a backbone ofsaid block copolymer; and (ii) the second component having a compositionthat is different from said first block copolymer; and directing saidincident electromagnetic radiation on to said structure.